On the apparent mobility in nanometric n-MOSFETs

被引:45
|
作者
Zilli, M. [1 ]
Esseni, D. [1 ]
Palestri, P. [1 ]
Selmi, L. [1 ]
机构
[1] Univ Udine, Dipartimento Ingn Elettr Gest & Maccan, I-33100 Udine, Italy
关键词
ballistic transport; characterization and simulation; mobility; multisubband Monte Carlo (MSMC);
D O I
10.1109/LED.2007.907553
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This letter investigates the definition and determination of mobility in nanometric metal-oxide-semiconductor transistors by means of multisubband Monte Carlo simulations. Our results clearly show that the transport in nano-MOSFETs, even for very small V-DS, is far from being uniform and local. Consequently, the apparent mobility extracted from the experiments is a channel-length-dependent quantity, which is only partly related to the uniform transport mobility. Our study comprises both the electrical and magnetoresistance mobility.
引用
收藏
页码:1036 / 1039
页数:4
相关论文
共 50 条
  • [21] INTERFACE STATE GENERATION MECHANISM IN N-MOSFETS
    YASUDA, N
    NAKAMURA, H
    TANIGUCHI, K
    HAMAGUCHI, C
    SOLID-STATE ELECTRONICS, 1989, 32 (12) : 1579 - 1583
  • [22] Influence of high channel doping on the inversion layer electron mobility in strained silicon n-MOSFETs
    Nayfeh, HM
    Leitz, CW
    Pitera, AJ
    Fitzgerald, EA
    Hoyt, JL
    Antoniadis, DA
    IEEE ELECTRON DEVICE LETTERS, 2003, 24 (04) : 248 - 250
  • [23] DEGRADATION BEHAVIOR OF DYNAMICALLY STRESSED N-MOSFETS
    WEBER, W
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1985, 32 (11) : 2543 - 2544
  • [24] Assessment of Ge n-MOSFETs by quantum simulation
    Rahman, A
    Ghosh, A
    Lundstrom, M
    2003 IEEE INTERNATIONAL ELECTRON DEVICES MEETING, TECHNICAL DIGEST, 2003, : 471 - 474
  • [25] Black Phosphorus n-MOSFETs with Record Transconductance
    Haratipour, Nazila
    Robbins, Matthew C.
    Koester, Steven J.
    2015 73RD ANNUAL DEVICE RESEARCH CONFERENCE (DRC), 2015, : 243 - 244
  • [26] MODEL FOR 1/F NOISE IN N-MOSFETS AND P-MOSFETS
    WOLTERS, DR
    ZEGERSVANDUIJNHOVEN, ATA
    MICROELECTRONIC ENGINEERING, 1995, 28 (1-4) : 167 - 170
  • [27] Impact of process-induced strain on Coulomb scattering mobility in short-channel n-MOSFETs
    Chen, William P. N.
    Su, Pin
    Goto, K.
    IEEE ELECTRON DEVICE LETTERS, 2008, 29 (07) : 768 - 770
  • [28] Dependence of the Channel Mobility in 3C-SiC n-MOSFETs on the Crystal Orientation and Channel Length
    Zippelius, Bernd
    Hauck, Martin
    Beljakowa, Svetlana
    Weber, Heiko B.
    Krieger, Michael
    Nagasawa, Hiroyuki
    Uchida, Hidetsugu
    Pensl, Gerhard
    Schoner, Adolf
    SILICON CARBIDE AND RELATED MATERIALS 2011, PTS 1 AND 2, 2012, 717-720 : 1113 - +
  • [29] The impact of interface states on the mobility and drive current of In0.53Ga0.47As semiconductor n-MOSFETs
    Osgnach, Patrik
    Caruso, Enrico
    Lizzit, Daniel
    Palestri, Pierpaolo
    Esseni, David
    Selmi, Luca
    SOLID-STATE ELECTRONICS, 2015, 108 : 90 - 96
  • [30] Energy balance simulation of submicrometer Si n-MOSFETs
    Butkovic, Z
    Baric, A
    MELECON '98 - 9TH MEDITERRANEAN ELECTROTECHNICAL CONFERENCE, VOLS 1 AND 2, 1998, : 354 - 357