First Experimental Evidence of an Intramolecular H Bond between Aliphatic Cl and Aromatic C-H
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作者:
Hu, Xiaoyun
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Wuhan Univ, Dept Chem, Wuhan 430072, Peoples R China
S Cent Univ Nationalities, Coll Chem & Mat, Wuhan 430073, Peoples R ChinaWuhan Univ, Dept Chem, Wuhan 430072, Peoples R China
Hu, Xiaoyun
[1
,2
]
Shan, Zixing
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Wuhan Univ, Dept Chem, Wuhan 430072, Peoples R ChinaWuhan Univ, Dept Chem, Wuhan 430072, Peoples R China
Shan, Zixing
[1
]
Sooshonok, Vadim A.
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Univ Basque Country UPV EHU, Fac Chem, Dept Organ Chem 1, San Sebastian 20018, Spain
Basque Fdn Sci, IKERBASQUE, Bilbao 48011, SpainWuhan Univ, Dept Chem, Wuhan 430072, Peoples R China
Sooshonok, Vadim A.
[3
,4
]
机构:
[1] Wuhan Univ, Dept Chem, Wuhan 430072, Peoples R China
[2] S Cent Univ Nationalities, Coll Chem & Mat, Wuhan 430073, Peoples R China
[3] Univ Basque Country UPV EHU, Fac Chem, Dept Organ Chem 1, San Sebastian 20018, Spain
[4] Basque Fdn Sci, IKERBASQUE, Bilbao 48011, Spain
The first example of an intramolecular H bond between aliphatic Cl and aromatic C H was observed in the crystal of C-2-symmetric (4R,5R)-4,5-bis(diphenylchloromethyl)-1,3,2-dioxathiolane 2-oxide. In this case one Cl atom is engaged in H-bonding with two ortho-C H groups in the axial and equatorial phenyl planes, with the recorded distances of 2.562 angstrom and 2.804 angstrom, respectively. The observed angle for Ca-H-Cl is 108.41 degrees and that. for C-q-H-Cl is 96.53 degrees.
机构:
Waseda Univ, Dept Appl Chem, Shinjuku Ku, 3-4-1 Ohkubo, Tokyo 1698555, JapanWaseda Univ, Dept Appl Chem, Shinjuku Ku, 3-4-1 Ohkubo, Tokyo 1698555, Japan
Okita, Toshimasa
Komatsuda, Masaaki
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Waseda Univ, Dept Appl Chem, Shinjuku Ku, 3-4-1 Ohkubo, Tokyo 1698555, JapanWaseda Univ, Dept Appl Chem, Shinjuku Ku, 3-4-1 Ohkubo, Tokyo 1698555, Japan
Komatsuda, Masaaki
Saito, Ami N.
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Waseda Univ, Dept Appl Chem, Shinjuku Ku, 3-4-1 Ohkubo, Tokyo 1698555, JapanWaseda Univ, Dept Appl Chem, Shinjuku Ku, 3-4-1 Ohkubo, Tokyo 1698555, Japan
Saito, Ami N.
Hisada, Tomoya
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Waseda Univ, Dept Appl Chem, Shinjuku Ku, 3-4-1 Ohkubo, Tokyo 1698555, JapanWaseda Univ, Dept Appl Chem, Shinjuku Ku, 3-4-1 Ohkubo, Tokyo 1698555, Japan
Hisada, Tomoya
Takahara, Tomoaki T.
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Waseda Univ, Dept Appl Chem, Shinjuku Ku, 3-4-1 Ohkubo, Tokyo 1698555, JapanWaseda Univ, Dept Appl Chem, Shinjuku Ku, 3-4-1 Ohkubo, Tokyo 1698555, Japan
Takahara, Tomoaki T.
Nakayama, Keito P.
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Waseda Univ, Dept Appl Chem, Shinjuku Ku, 3-4-1 Ohkubo, Tokyo 1698555, JapanWaseda Univ, Dept Appl Chem, Shinjuku Ku, 3-4-1 Ohkubo, Tokyo 1698555, Japan
Nakayama, Keito P.
Isshiki, Ryota
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Waseda Univ, Dept Appl Chem, Shinjuku Ku, 3-4-1 Ohkubo, Tokyo 1698555, JapanWaseda Univ, Dept Appl Chem, Shinjuku Ku, 3-4-1 Ohkubo, Tokyo 1698555, Japan
Isshiki, Ryota
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Takise, Ryosuke
Muto, Kei
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Waseda Univ, Dept Appl Chem, Shinjuku Ku, 3-4-1 Ohkubo, Tokyo 1698555, JapanWaseda Univ, Dept Appl Chem, Shinjuku Ku, 3-4-1 Ohkubo, Tokyo 1698555, Japan
机构:
Indian Inst Sci Educ & Res Kolkata, Dept Chem Sci, Nadia 741246, W Bengal, IndiaIndian Inst Sci Educ & Res Kolkata, Dept Chem Sci, Nadia 741246, W Bengal, India
Sarkar, Raju
Jaiswar, Akhilesh
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Indian Inst Sci Educ & Res Kolkata, Dept Chem Sci, Nadia 741246, W Bengal, IndiaIndian Inst Sci Educ & Res Kolkata, Dept Chem Sci, Nadia 741246, W Bengal, India