Analysis of AlGaN/GaN HEMT using discrete field plate technique for high power and high frequency applications

被引:57
|
作者
Fletcher, A. S. Augustine [1 ]
Nirmal, D. [1 ]
Ajayan, J. [2 ]
Arivazhagan, L. [1 ]
机构
[1] Karunya Inst Technol & Sci, Dept ECE, Coimbatore, Tamil Nadu, India
[2] SNS Coll Technol, Coimbatore, Tamil Nadu, India
关键词
GaN HEMT; Electric field; Breakdown voltage; Field plate; Cut off frequency; ELECTRON-MOBILITY TRANSISTORS; BREAKDOWN VOLTAGE; PASSIVATION; RF; SI;
D O I
10.1016/j.aeue.2018.12.006
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this paper, the RF and DC characteristicS of AlGaN/GaN High electron mobility transistor is analysed using discrete field plate technique. Surprisingly, it reduces the device parasitic capacitance exhibiting very low C-Gs and C-GD of 5.8 x 10(-13) F/mm and 4.2 x 10(-13) F/mm respectively to improve the cut off frequency (f(T)) from 17.5 GHz to 20 GHz. The discrete field plate suppresses the maximum electric field between gate and drain region to achieve the high breakdown voltage of 330 V. The maximum transconductance (g(m)) achieved is 275 mS/mm, ensuring the better DC operation of the device. The simulated results clearly show that, the discrete field plate HEMTs are superior in performance over conventional GaN FP-HEMTs for future high frequency and high power applications. (C) 2018 Elsevier GmbH. All rights reserved.
引用
收藏
页码:325 / 330
页数:6
相关论文
共 50 条
  • [31] Performance of AlGaN/GaN based Common Drain Dual HEMT (CDD-HEMT) for high power applications
    Pal, Praveen
    Pratap, Yogesh
    Gupta, Mridula
    Kabra, Sneha
    2019 IEEE MTT-S INTERNATIONAL MICROWAVE AND RF CONFERENCE (IMARC), 2019,
  • [32] Analysis of AlGaN/GaN HEMT and Its Operational Improvement Using a Grated Gate Field Plate
    Aasif Mohammad Bhat
    Nawaz Shafi
    Chitrakant Sahu
    C. Periasamy
    Journal of Electronic Materials, 2021, 50 : 6218 - 6227
  • [33] Analysis of AlGaN/GaN HEMT and Its Operational Improvement Using a Grated Gate Field Plate
    Bhat, Aasif Mohammad
    Shafi, Nawaz
    Sahu, Chitrakant
    Periasamy, C.
    JOURNAL OF ELECTRONIC MATERIALS, 2021, 50 (11) : 6218 - 6227
  • [34] Influence of High-k Passivation Layer on Gate Field Plate AlGaN/GaN/AlGaN Double Heterojunction HEMT
    Natarajan, Ramkumar
    Parthasarathy, Eswaran
    Murugapandiyan, P.
    SILICON, 2022, 14 (16) : 10437 - 10445
  • [35] Influence of High-k Passivation Layer on Gate Field Plate AlGaN/GaN/AlGaN Double Heterojunction HEMT
    Ramkumar Natarajan
    Eswaran Parthasarathy
    P. Murugapandiyan
    Silicon, 2022, 14 : 10437 - 10445
  • [36] A nanoscale AlGaN/GaN HEMT on BGO substrate with recessed T gate for high frequency applications
    Anju S.
    Suresh Babu V.
    paul G.
    Jacob B.
    Materials Today: Proceedings, 2023, 80 : 2076 - 2079
  • [37] Potential and electric field analysis of field plated AlGaN/GaN HEMT for high voltage applications using 2-D analytical approach
    Chugh, Nisha
    Haldar, Subhasis
    Bhattacharya, Monika
    Gupta, R. S.
    MICROELECTRONICS JOURNAL, 2023, 138
  • [38] Comparative Analysis of Different Types of Gate Field Plate AlGaN/GaN HEMT
    Kharei, Pichingla
    Baidya, Achinta
    Maity, Niladri Pratap
    MICRO AND NANOELECTRONICS DEVICES, CIRCUITS AND SYSTEMS, 2023, 904 : 89 - 95
  • [39] Mob power, high efficiency, AlGaN/GaN HEMT technology for wireless base station applications
    Vetury, R
    Wei, Y
    Green, SR
    Mercier, TW
    Leverich, K
    Garber, PM
    Poulton, MJ
    Shealy, JB
    2005 IEEE MTT-S International Microwave Symposium, Vols 1-4, 2005, : 487 - 490
  • [40] High-power monolithic AlGaN/GaN HEMT switch for X-band applications
    Ciccognani, W.
    De Dominicis, M.
    Ferrari, M.
    Limiti, E.
    Peroni, M.
    Romanini, P.
    ELECTRONICS LETTERS, 2008, 44 (15) : 911 - 913