OES diagnostic of radicals in 33MHz radiofrequency Ar/C2H5OH atmospheric pressure plasma jet

被引:5
|
作者
Yuan, Qianghua [1 ]
Ren, Pei [1 ]
Zhou, Yongjie [1 ]
Yin, Guiqin [1 ]
Dong, Chenzhong [1 ]
机构
[1] Northwest Normal Univ, Coll Phys & Elect Engn, Key Lab Atom & Mol Phys & Funct Mat Gansu Prov, Lanzhou 730070, Gansu, Peoples R China
基金
中国国家自然科学基金; 中国博士后科学基金;
关键词
atmospheric pressure plasma; optical emission spectroscopy; radical analysis; CHEMICAL KINETIC DATABASE; COMBUSTION CHEMISTRY; ETHANOL; POLYMERIZATION; DECOMPOSITION; DISCHARGE; MECHANISM; ARC;
D O I
10.1088/2058-6272/aaebd1
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
Ar/C2H5OH plasma jet is generated at atmospheric pressure by 33 MHz radio-frequency power source. This RF excitation frequencies which are higher than 13.56 MHz had rarely been used in atmospheric pressure plasma. The plasma characteristics of ethanol are investigated. The introduction of ethanol leads to the generation of four excited carbonaceous species C, CN, CH and C-2 in plasma, respectively. Optical emission intensities of four carbonaceous species were strengthened with ethanol content increasing in the range of 0-4600 ppm. The ethanol content increase results in all the Ar spectra lines decrease. The reason is that the electron temperature decreases when ethanol content is high. The emission intensity ratios of C/C-2, CN/C-2 and CH/C-2 decrease with the increase of ethanol content, showing that the relative amount of C-2 is increasing by increasing the ethanol flow. The emission intensity ratios of excited species did not change much with the increase of RF power in stable discharge mode.
引用
收藏
页数:8
相关论文
共 50 条
  • [21] Graphite-like and polymer-like carbon films formation from Ar/C2H2 at atmospheric pressure by plasma jet
    Grigonis, Alfonsas
    Marcinauskas, Liutauras
    Valincius, Vitas
    PRZEGLAD ELEKTROTECHNICZNY, 2010, 86 (07): : 72 - 74
  • [22] Selective removal of parylene-C film by ultrafine Ar/O2 atmospheric pressure plasma jet
    Department of Micro/Nano Electronics, Shanghai Jiaotong University, Shanghai, China
    不详
    不详
    Qiangjiguang Yu Lizishu, 2
  • [23] Measurement and Prediction of Vapor Pressure for H2O + CH3OH/C2H5OH + [BMIM][DBP] Ternary Working Fluids
    Zhang Xiaodong
    Hu Dapeng
    Zhao Zongchang
    CHINESE JOURNAL OF CHEMICAL ENGINEERING, 2013, 21 (08) : 886 - 893
  • [24] Characterization of atmospheric pressure H2O/O2 gliding arc plasma for the production of OH and O radicals
    Roy, N. C.
    Hafez, M. G.
    Talukder, M. R.
    PHYSICS OF PLASMAS, 2016, 23 (08)
  • [25] Measurement and correlation of vapor pressure for binary systems: [EMIM][DEP] + H2O/C2H5OH as working pairs
    Zhao, Zong-Chang
    Yan, Shuang-Hua
    Zhang, Xiao-Dong
    Zuo, Gui-Lan
    He, Zong-Bao
    Ren, Jing
    Dalian Ligong Daxue Xuebao/Journal of Dalian University of Technology, 2010, 50 (05): : 638 - 642
  • [26] Characteristics of NOx removal combining dielectric barrier discharge plasma with selective catalytic reduction by C2H5OH
    Wang, Xing-Quan
    Chen, Wei
    Guo, Qi-Pei
    Li, Yi
    Lv, Guo-Hua
    Sun, Xiu-Ping
    Zhang, Xian-Hui
    Feng, Ke-Cheng
    Yang, Si-Ze
    JOURNAL OF APPLIED PHYSICS, 2009, 106 (01)
  • [27] Validation of in situ diagnostics for the detection of OH and H2O2 in liquids treated by a humid atmospheric pressure plasma jet
    Schuettler, Steffen
    Jolmes, Ludwig
    Jess, Emanuel
    Tschulik, Kristina
    Golda, Judith
    PLASMA PROCESSES AND POLYMERS, 2024, 21 (02)
  • [28] Effect of water vapor on plasma processing at atmospheric pressure: Polymer etching and surface modification by an Ar/H2O plasma jet
    Luan, Pingshan
    Kondeti, V. S. Santosh K.
    Knoll, Andrew J.
    Bruggeman, Peter J.
    Oehrlein, Gottlieb S.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2019, 37 (03):
  • [29] Dry etching of palladium thin films in high density plasmas of CH3OH/Ar, C2H5OH/Ar, CH4/Ar, and CH4/O2/Ar gas mixtures
    Lee, Jae Yong
    Choi, Jae Sang
    Cho, Doo Hyun
    Hwang, Su Min
    Chung, Chee Won
    THIN SOLID FILMS, 2017, 636 : 325 - 332
  • [30] Sn Etching of Extreme Ultraviolet (EUV) Mirror Surface Using Ar-H2 Atmospheric Pressure Arc Plasma Jet
    Kim, Ju Sung
    Choi, Jinsung
    Hong, Young June
    Choi, Eun Ha
    PLASMA CHEMISTRY AND PLASMA PROCESSING, 2023, 43 (05) : 975 - 990