Atomic Layer Deposition of TiO2 on Graphene for Supercapacitors

被引:185
|
作者
Sun, Xiang [1 ]
Xie, Ming [2 ,3 ]
Wang, Gongkai [1 ]
Sun, Hongtao [1 ]
Cavanagh, Andrew S. [2 ,3 ]
Travis, Jonathan J. [2 ,3 ]
George, Steven M. [2 ,3 ]
Lian, Jie [1 ]
机构
[1] Rensselaer Polytech Inst, Dept Mech Aerosp & Nucl Engn, Troy, NY 12180 USA
[2] Univ Colorado, Dept Chem & Biochem, Boulder, CO 80309 USA
[3] Univ Colorado, Dept Chem & Biol Engn, Boulder, CO 80309 USA
基金
美国国家科学基金会;
关键词
ELECTROCHEMICAL CAPACITORS; CARBON NANOTUBES; PHOTOCATALYTIC ACTIVITY; TITANIA NANOTUBES; ROTARY REACTOR; FILMS; ELECTRODES; NANOPARTICLES; PERFORMANCE; GRAPHITE;
D O I
10.1149/2.025204jes
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
A nano-scaled coating of titanium oxide (TiO2) on graphene (G) has been achieved via a novel atomic layer deposition (ALD) method. As a potential supercapacitor material, the TiO2-G composites exhibited a capacity of 75 F/g and 84 F/g at a scan rate of 10 mV/s for composites grown using 50 and 100 ALD cycles, respectively. The nearly identical Nyquist plots of the TiO2-G composites compared with those of pure graphene demonstrated that the composites possess excellent conductivity for charge transfer and open structures for ion diffusion. In addition, even with 3-4 times additional mass loading (maximum 3.22 mg/cm(2)), the composites exhibit no obvious degradation with respect to the electrochemical performance. This ALD approach presents a promising route to synthesize advanced graphene-based nanocomposites for supercapacitor applications. (C) 2012 The Electrochemical Society. [DOI: 10.1149/2.025204jes] All rights reserved.
引用
收藏
页码:A364 / A369
页数:6
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