Numerical study of the resolution in a model near-field optical microscope

被引:0
|
作者
Valencia, C [1 ]
Méndez, ER [1 ]
机构
[1] Ctr Invest Cient & Educ Super Ensenada, Div Fis Aplicada, Ensenada, Baja California, Mexico
来源
SCATTERING AND SURFACE ROUGHNESS III | 2000年 / 4100卷
关键词
D O I
10.1117/12.401651
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We present numerical calculations for a model illumination mode Scanning Near-field Optical Microscope (SNOM) that provide some guidelines for the determination of the resolution of such instruments. The calculations of the nearfield intensity distribution inside the tapered waveguide show that the metal employed in their coating determines the degree of confinement of the radiation and, thus, the size of the effective source at the exit end of the waveguide. It is argued that a simple measure of the ultimate resolution of near-field microscopes is provided by the skin depth of the metal employed in the coating of the tapered waveguide. These ideas are supported by the calculated near-field intensity distributions in the neighborhood of the tapered waveguide, and by the simulated images of a two-cylinder object.
引用
收藏
页码:124 / 130
页数:7
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