Formation by dip coating of highly ordered and closely packed, self assembled monolayers (SAMs) of microsized silica spheres has been reported. Under optimized coating conditions, SAMs were formed with 2 mu m diameter silica spheres on record-breakingly large areas, measuring 3x10 mm(2) on silicon substrates and 1.5x11 mm(2) on glass substrates. The SAMs structure and their spatial extension were significantly influenced by the concentration of the solution, withdrawal speed, immersion time, relative humidity, types of solvent and substrate material. The SAMs of silica microspheres provide a glimpse into the wide range of photonic applications for dip coating such as surface texturing and anti-reflection coatings.
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Seoul Natl Univ, Sch Mech & Aerosp Engn, Seoul 151742, South KoreaSeoul Natl Univ, Sch Mech & Aerosp Engn, Seoul 151742, South Korea
Jang, Eui Yun
Kang, Tae June.
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Seoul Natl Univ, Sch Mech & Aerosp Engn, Seoul 151742, South KoreaSeoul Natl Univ, Sch Mech & Aerosp Engn, Seoul 151742, South Korea
Kang, Tae June.
Im, Hyeong Wook
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Seoul Natl Univ, Sch Mech & Aerosp Engn, Seoul 151742, South KoreaSeoul Natl Univ, Sch Mech & Aerosp Engn, Seoul 151742, South Korea
Im, Hyeong Wook
Kim, Dae Weon
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Pusan Natl Univ, Sch Mech Engn, Pusan 609735, South KoreaSeoul Natl Univ, Sch Mech & Aerosp Engn, Seoul 151742, South Korea
Kim, Dae Weon
Kim, Yong Hyup
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Seoul Natl Univ, Sch Mech & Aerosp Engn, Seoul 151742, South Korea
Seoul Natl Univ, Inst Adv Aerosp Technol, Seoul 151742, South KoreaSeoul Natl Univ, Sch Mech & Aerosp Engn, Seoul 151742, South Korea