Characterization of transparent and conducting Sn-doped β-Ga2O3 single crystal after annealing
被引:105
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作者:
Ohira, Shigeo
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机构:
Nippon Light Met Co Ltd, Shimizu Ku, Shizuoka 4213291, Japan
Tohoku Univ, Inst Mat Res, Sendai, Miyagi 9808577, JapanNippon Light Met Co Ltd, Shimizu Ku, Shizuoka 4213291, Japan
Ohira, Shigeo
[1
,3
]
Suzuki, Norihito
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机构:
Nippon Light Met Co Ltd, Shimizu Ku, Shizuoka 4213291, JapanNippon Light Met Co Ltd, Shimizu Ku, Shizuoka 4213291, Japan
Suzuki, Norihito
[1
]
Arai, Naoki
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机构:
Nippon Light Met Co Ltd, Shimizu Ku, Shizuoka 4213291, JapanNippon Light Met Co Ltd, Shimizu Ku, Shizuoka 4213291, Japan
Arai, Naoki
[1
]
Tanaka, Masahiko
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机构:
Natl Inst Mat Sci, Sayo, Hyogo 6795198, JapanNippon Light Met Co Ltd, Shimizu Ku, Shizuoka 4213291, Japan
Tanaka, Masahiko
[2
]
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机构:
Sugawara, Takamasa
[3
]
Nakajima, Kazuo
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机构:
Tohoku Univ, Inst Mat Res, Sendai, Miyagi 9808577, JapanNippon Light Met Co Ltd, Shimizu Ku, Shizuoka 4213291, Japan
Nakajima, Kazuo
[3
]
Shishido, Toetsu
论文数: 0引用数: 0
h-index: 0
机构:
Tohoku Univ, Inst Mat Res, Sendai, Miyagi 9808577, JapanNippon Light Met Co Ltd, Shimizu Ku, Shizuoka 4213291, Japan
Shishido, Toetsu
[3
]
机构:
[1] Nippon Light Met Co Ltd, Shimizu Ku, Shizuoka 4213291, Japan
[2] Natl Inst Mat Sci, Sayo, Hyogo 6795198, Japan
[3] Tohoku Univ, Inst Mat Res, Sendai, Miyagi 9808577, Japan
beta-Ga2O3 single crystal;
Sn-doping;
annealing;
electrical resistivity;
optical transmittance;
D O I:
10.1016/j.tsf.2007.10.083
中图分类号:
T [工业技术];
学科分类号:
08 ;
摘要:
Sn-doped beta-Ga2O3 single crystals with (100) plane were grown using the floating zone method, and the effect of the thermal annealing on the surface morphology, and electrical and optical properties was examined to compared with that before annealing. It was found that the surface morphology and roughness, electrical properties and optical transmittance did not change after annealing at 1100 degrees C in oxygen atmosphere, and the doped Sri was dispersed in beta-Ga2O3 matrix uniformly. However, the thermal annealing of Sn-doped beta-Ga2O3 causes the segregation of Sri atoms in the near-surface region, and the enhancement of the cathode luminescence (CL) intensity and the peak position toward longer wavelength. These results suggest that Sn-doped beta-Ga2O3 single crystal is thermally stable and is useful as substrate for the growth condition of GaN-based compounds. (C) 2007 Elsevier B.V. All rights reserved.
机构:
Univ Sci & Technol China, State Key Lab Particle Detect & Elect, Hefei 230026, Peoples R ChinaUniv Sci & Technol China, State Key Lab Particle Detect & Elect, Hefei 230026, Peoples R China
Li, Y. H.
Dong, Y.
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Univ Sci & Technol China, State Key Lab Particle Detect & Elect, Hefei 230026, Peoples R ChinaUniv Sci & Technol China, State Key Lab Particle Detect & Elect, Hefei 230026, Peoples R China
Dong, Y.
Xu, G. W.
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Univ Sci & Technol China, Sch Microelect, Hefei 230026, Peoples R ChinaUniv Sci & Technol China, State Key Lab Particle Detect & Elect, Hefei 230026, Peoples R China
Xu, G. W.
Bu, Y. Z.
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机构:
Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Res Ctr Laser Crystal, Shanghai 201800, Peoples R ChinaUniv Sci & Technol China, State Key Lab Particle Detect & Elect, Hefei 230026, Peoples R China
Bu, Y. Z.
Sai, Q. L.
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Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Res Ctr Laser Crystal, Shanghai 201800, Peoples R ChinaUniv Sci & Technol China, State Key Lab Particle Detect & Elect, Hefei 230026, Peoples R China
Sai, Q. L.
Qi, H. J.
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Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Res Ctr Laser Crystal, Shanghai 201800, Peoples R ChinaUniv Sci & Technol China, State Key Lab Particle Detect & Elect, Hefei 230026, Peoples R China
Qi, H. J.
Long, S. B.
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Univ Sci & Technol China, Sch Microelect, Hefei 230026, Peoples R ChinaUniv Sci & Technol China, State Key Lab Particle Detect & Elect, Hefei 230026, Peoples R China
Long, S. B.
Chen, Z. Q.
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机构:
Wuhan Univ, Dept Phys, Hubei Nucl Solid Phys Key Lab, Wuhan 430072, Peoples R ChinaUniv Sci & Technol China, State Key Lab Particle Detect & Elect, Hefei 230026, Peoples R China
Chen, Z. Q.
Ye, B. J.
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Univ Sci & Technol China, State Key Lab Particle Detect & Elect, Hefei 230026, Peoples R ChinaUniv Sci & Technol China, State Key Lab Particle Detect & Elect, Hefei 230026, Peoples R China
Ye, B. J.
Zhang, H. J.
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Univ Sci & Technol China, State Key Lab Particle Detect & Elect, Hefei 230026, Peoples R ChinaUniv Sci & Technol China, State Key Lab Particle Detect & Elect, Hefei 230026, Peoples R China
机构:
South China Normal Univ, Sch Semicond Sci & Technol, Foshan 528225, Peoples R China
Guangdong Prov Key Lab Chip & Integrat Technol, Guangzhou 510631, Peoples R China
Hangzhou Inst Opt & Fine Mech, Hangzhou 311421, Peoples R ChinaSouth China Normal Univ, Sch Semicond Sci & Technol, Foshan 528225, Peoples R China
Wei, Jinshan
Bu, Yuzhe
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Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai 201800, Peoples R ChinaSouth China Normal Univ, Sch Semicond Sci & Technol, Foshan 528225, Peoples R China
Bu, Yuzhe
Sai, Qinglin
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Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai 201800, Peoples R ChinaSouth China Normal Univ, Sch Semicond Sci & Technol, Foshan 528225, Peoples R China
Sai, Qinglin
Qi, Hongji
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机构:
Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai 201800, Peoples R China
Hangzhou Inst Opt & Fine Mech, Hangzhou 311421, Peoples R ChinaSouth China Normal Univ, Sch Semicond Sci & Technol, Foshan 528225, Peoples R China
Qi, Hongji
Li, Jingbo
论文数: 0引用数: 0
h-index: 0
机构:
South China Normal Univ, Sch Semicond Sci & Technol, Foshan 528225, Peoples R China
Guangdong Prov Key Lab Chip & Integrat Technol, Guangzhou 510631, Peoples R ChinaSouth China Normal Univ, Sch Semicond Sci & Technol, Foshan 528225, Peoples R China
Li, Jingbo
Gu, Huaimin
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机构:
South China Normal Univ, Sch Semicond Sci & Technol, Foshan 528225, Peoples R China
Guangdong Prov Key Lab Chip & Integrat Technol, Guangzhou 510631, Peoples R ChinaSouth China Normal Univ, Sch Semicond Sci & Technol, Foshan 528225, Peoples R China