Liquid Crystal Alignment on Thin Organic Films Deposited in a Low Pressure Plasma Enhanced CVD Reactor

被引：0
|
作者：
Baitukha, Alibi [1 ]
Mori, Shinsuke [1 ]
Suzuki, Masaaki [1 ]
机构：
[1] Tokyo Inst Technol, Dept Chem Engn, Meguro Ku, Tokyo 1528552, Japan
来源：
PLASMA PROCESSES AND POLYMERS | 2015年 / 12卷 / 05期
关键词：
alignment layer; ion bombardment; plasma enhanced chemical vapor deposition (PECVD); plasma treatment; ATOMIC-BEAM ALIGNMENT; C-H FILMS; ATMOSPHERIC-PRESSURE; ION-BEAM; POLYIMIDE FILMS; SURFACE; MICROSTRUCTURE; IRRADIATION; PLANAR; LIGHT;
D O I：
10.1002/ppap.201400079
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
The application of a low pressure plasma enhanced chemical vapor deposition (PECVD) system is considered for the deposition of thin carbon films with alignment properties for liquid crystals (LC). The original electrode configuration induces directional planar alignment properties on deposited films, and makes possible to fabricate alignment layer in a one step process. To evaluate the LC alignment properties LC cells are assembled from substrates with deposited carbon films and observed in a polarizing optical microscope. Directional ion bombardment induced by the electrode configuration is considered to be the cause of the observed LC molecules alignment. The simultaneous deposition and ion bombardment processes induce a favorable condition for depositing carbon films with anisotropic properties.
引用
收藏
页码：450 / 455
页数：6
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