Synthesis and growth mechanism of silicon nitride nanostructures

被引:3
|
作者
Xie, ZP [1 ]
Yang, WY
Miao, HZ
Zhang, LG
An, LN
机构
[1] Tsing Hua Univ, State Key Lab New Ceram & Fine Proc, Beijing 100084, Peoples R China
[2] Chinese Acad Sci, Lab Excited State Proc, Changchun Inst Opt Fine Mech & Phys, Changchun, Peoples R China
[3] Univ Cent Florida, Adv Mat Proc & Anal Ctr, Orlando, FL 32816 USA
关键词
polyureasilazane; pyrolysis; Si3N4; nanostructures; growth mechanism;
D O I
10.4028/www.scientific.net/MSF.475-479.1239
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A new method to synthesize Si3N4 nanostructures via catalyst-assisted polymeric precursor pyrolysis is present in this article. The as-prepared nanobelts are single crystals with a uniform thickness and width along the entire length, and contain no detectable defects such as dislocations or stacking faults. The thickness and width of Si3N4 nanobelts range from 40 to 60 run and 600 to 1200 nm, respectively, and the lengths can be up to several millimeters. The growth directions of alpha-Si3N4 nanobelts are [101] and [100]. A solid-liquid-solid and gas-solid reaction/crystallization is proposed for the growth of S3N4 nonastructures.
引用
收藏
页码:1239 / 1242
页数:4
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