Adhesion and reliability of polymer/inorganic interfaces

被引:44
|
作者
Kook, SY [1 ]
Snodgrass, JM
Kirtikar, A
Dauskardt, RH
机构
[1] Stanford Univ, Dept Mat Sci & Engn, Stanford, CA 94305 USA
[2] Intel Corp, Assembly Technol, Chandler, AZ 85226 USA
关键词
D O I
10.1115/1.2792642
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The reliability of microelectronic components is profoundly influenced by the interfacial fracture resistance (adhesion) and associated progressive debonding behavior. In this study we examine the interfacial fracture properties of representative polymer interfaces commonly found in microelectronic applications. Specifically, interface fracture mechanics techniques are described to characterize adhesion and progressive bebonding behavior of a polymer/metal interface under monotonic and cyclic fatigue lending conditions. Cyclic fatigue debond-growth rates were measured from similar to 10(-11) to 10(-6) m/cycle and found to display a power-law dependence on the applied strain energy release rate range, Delta G. Fracture toughness test results show that the interfaces typically exhibit resistance-curve behavior, with a plateau interface fracture resistance, G(ss), strongly dependent on the interface morphology and the thickness of the polymer layer. The effect of a chemical adhesion promoter on the fracture energy of a polymer/silicon interface was also characterized Micromechanisms controlling interfacial adhesion and progressive debonding are discussed in terms of the prevailing deformation mechanisms and related to interface structure and morphology.
引用
收藏
页码:328 / 335
页数:8
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