Formation/dissolution of metallic nanoparticles in SiO2 film using cw and ns UV exposure

被引：0
|
作者：
Choi, J. [1 ]
Massera, J. [2 ]
Petit, L. [2 ]
Richardson, M. [1 ]
Obeng, Y. [3 ]
Richardson, K.
机构：
[1] Univ Cent Florida, Coll Opt CREOL, 4000 Cent Florida Blvd, Orlando, FL 32816 USA
[2] Clemson Univ, Sch Mat Sci & Engn, Adv Mat Res Lab, Clemson, SC 29625 USA
[3] Nkanea Technologies Inc, Frisco, TX 75035 USA
来源：
2007 PACIFIC RIM CONFERENCE ON LASERS AND ELECTRO-OPTICS, VOLS 1-4 | 2007年
关键词：
D O I：
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中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
We show the possibility to control the Cu and the An nanoparticles to precipitate/dissolve selectively in a SiO2 glass matrix using UV/IR light sources with micron resolution. The fabricated/dissolved structures have been characterized using UV-Vis-NIR spectroscopy. A micro-Thermal-analyzer has been used to verify the presence of nanoparticles in the film.
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页码：345 / +
页数：2
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