Large area high density quantized magnetic disks fabricated using nanoimprint lithography

被引:164
|
作者
Wu, W [1 ]
Cui, B [1 ]
Sun, XY [1 ]
Zhang, W [1 ]
Zhuang, L [1 ]
Kong, LS [1 ]
Chou, SY [1 ]
机构
[1] Princeton Univ, Dept Elect Engn, NanoStruct Lab, Princeton, NJ 08544 USA
来源
关键词
D O I
10.1116/1.590417
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A new low-cost, high throughput method was developed for fabricating large area quantized magnetic disks (QMDs) using nanoimprint lithography (NIL), electroplating, and chemical mechanical polishing. Perpendicular QMDs with a density of 18 Gbit/in.(2) and good uniformity over an area of 4 cm x 4 cm (total 45 Gbit) have been achieved, as well as longitudinal QMDs of 30 Gbit/in.(2) The NIL molds for the perpendicular QMDs were fabricated using double NIL with a grating mold. The magnetic properties of both types of QMDs were studied by magnetic force microscopy. (C) 1998 American Vacuum Society. [S0734-211X(98)15406-9].
引用
收藏
页码:3825 / 3829
页数:5
相关论文
共 50 条
  • [11] Large Area High Density Sub-20 nm SiO2 Nanostructures Fabricated by Block Copolymer Template for Nanoimprint Lithography
    Park, Hui Joon
    Kang, Myung-Gyu
    Guo, L. Jay
    ACS NANO, 2009, 3 (09) : 2601 - 2608
  • [12] Study of large area high density magnetic dot arrays fabricated using synchrotron radiation based x-ray lithography
    Rousseaux, F
    Decanini, D
    Carcenac, F
    Cambril, E
    Ravet, MF
    Chappert, C
    Bardou, N
    Bartenlian, B
    Veillet, P
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1995, 13 (06): : 2787 - 2791
  • [13] Nano-compact disks with 400 Gbit/in(2) storage density fabricated using nanoimprint lithography and read with proximal probe
    Krauss, PR
    Chou, SY
    APPLIED PHYSICS LETTERS, 1997, 71 (21) : 3174 - 3176
  • [14] Nanoimprint lithography for a large area pattern replication
    Lebib, A
    Chen, Y
    Bourneix, J
    Carcenac, F
    Cambril, E
    Couraud, L
    Launois, H
    MICROELECTRONIC ENGINEERING, 1999, 46 (1-4) : 319 - 322
  • [15] Visible Metalenses with High Focusing Efficiency Fabricated Using Nanoimprint Lithography
    McClung, Andrew
    Torfeh, Mahsa
    Einck, Vincent J.
    Watkins, James J.
    Arbabi, Amir
    ADVANCED OPTICAL MATERIALS, 2024, 12 (09)
  • [16] High electron mobility transistors fabricated by nanoimprint lithography
    Chen, Y
    Macintyre, DS
    Boyd, E
    Moran, D
    Thayne, I
    Thoms, S
    MICROELECTRONIC ENGINEERING, 2003, 67-8 : 189 - 195
  • [17] High quality Bragg gratings fabricated by Nanoimprint Lithography
    Zhang, Yi Wen
    Wang, Lei
    Yu, Yong Lin
    Wang, Ding Li
    Zhou, Ning
    Liu, Wen
    3RD INTERNATIONAL PHOTONICS AND OPTOELECTRONICS MEETINGS (POEM 2010), 2011, 276
  • [18] Antibacterial hierarchical surface fabricated using nanoimprint lithography
    Oopath, Sruthi Venugopal
    Martins, Jarrod
    Kakarla, Akesh Babu
    Petrovski, Steve
    Kong, Ing
    Baji, Avinash
    JOURNAL OF APPLIED POLYMER SCIENCE, 2024, 141 (20)
  • [19] Step and repeat UV-nanoimprint lithography using a large area stamp
    Jeong, J
    Sima, Y
    Sohn, H
    Lee, E
    Emerging Lithographic Technologies IX, Pts 1 and 2, 2005, 5751 : 227 - 235
  • [20] Magnetic properties of large-area particle arrays fabricated using block copolymer lithography
    Cheng, JY
    Ross, CA
    Thomas, EL
    Smith, HI
    Lammertink, RGH
    Vancso, GJ
    IEEE TRANSACTIONS ON MAGNETICS, 2002, 38 (05) : 2541 - 2543