Thin films of mesoporous silica: characterization and applications

被引：30
|
作者：
Chao, KJ [1 ]
Liu, PH [1 ]
Huang, KY [1 ]
机构：
[1] Natl Tsing Hua Univ, Dept Chem, Hsinchu 300, Taiwan
来源：
COMPTES RENDUS CHIMIE | 2005年 / 8卷 / 3-4期
关键词：
mesoporous film; silica; XRR; GlXD; low-k; photoluminescence;
D O I：
10.1016/j.crci.2005.01.004
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
Characterization of mesoporous thin films and its implication in applications are presented in this report. It was found that optical, electrical and mechanical properties of mesoporous thin films prepared through surfactant templating are dependent on the film thickness, porosity, pore size and pore structure. A good understanding of the film properties thus becomes crucial to have a good handle on the electronic and optical applications of these materials. (c) 2005 Academie des sciences. Published by Elsevier SAS. All rights reserved.
引用
收藏
页码：727 / 739
页数：13
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