Effects of pulsed anodic oxide on the intermixing in InGaAs/GaAs and InGaAs/AlGaAs quantum wells

被引:4
|
作者
Yuan, S [1 ]
Liu, CY
Zhao, F
Chan, MCY
Tsui, WK
Dao, LV
Liu, XQ
机构
[1] Nanyang Technol Univ, Sch Mat Engn, Singapore 639798, Singapore
[2] Univ Hong Kong, Dept Elect & Elect Engn, Hong Kong, Hong Kong, Peoples R China
[3] Swinburne Univ Technol, CAOUS, Melbourne, Vic 3122, Australia
[4] Australian Natl Univ, Dept Elect Mat Engn, Canberra, ACT 0200, Australia
关键词
D O I
10.1063/1.1577407
中图分类号
O59 [应用物理学];
学科分类号
摘要
Intermixing in InGaAs/GaAs and InGaAs/AlGaAs quantum well structures after rapid thermal annealing with and without an anodic oxide cap on the surface was studied by low temperature (8 K) photoluminescence (PL). The PL peak energy was shifted towards higher photon energies (blueshift) in both types of samples, especially at annealing temperatures above 880 degreesC. The anodic oxide cap has been demonstrated to inhibit the band-gap blueshift of the quantum well structures. Secondary ion mass spectroscopy data indicated that Ga vacancies were injected from the anodic oxide cap into the epitaxial layers. These vacancies enhanced interdiffusion between group III atoms, and partially relaxed the strain in the structure, resulting in the effect of the suppression of the blueshift. (C) 2003 American Institute of Physics.
引用
收藏
页码:9823 / 9829
页数:7
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