Preparation of Ga-doped ZnO films by pulsed dc magnetron sputtering with cylindrical rotating target for thin film solar cell applications

被引:20
|
作者
Shin, Beom-Ki [1 ]
Lee, Tae-Il [1 ]
Park, Ji-Hyeon [1 ]
Park, Kang-Il [2 ]
Ahn, Kyung-Jun [2 ]
Park, Sung-Kee [3 ]
Lee, Woong [4 ]
Myoung, Jae-Min [1 ]
机构
[1] Yonsei Univ, Dept Mat Sci & Engn, Seoul 120749, South Korea
[2] SNTEK Co Ltd, Suwon 441813, Gyeonggi, South Korea
[3] LG Display Co Ltd, R&D Ctr, Paju 413811, Gyeonggi, South Korea
[4] Changwon Natl Univ, Sch Nano & Adv Mat Engn, Chang Won 641773, Gyeongnam, South Korea
关键词
Transparent conductive oxide (TCO); Solar cell; Ga-doped ZnO (GZO); Pulsed dc magnetron sputtering; Cylindrical rotating target; Surface texturing; TEMPERATURE; TCO;
D O I
10.1016/j.apsusc.2011.08.128
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Applicability of Ga-doped ZnO (GZO) films for thin film solar cells (TFSCs) was investigated by preparing GZO films via pulsed dc magnetron sputtering (PDMS) with rotating target. The GZO films showed improved crystallinity and increasing degree of Ga doping with increasing thickness to a limit of 1000 nm. The films also fulfilled requirements for the transparent electrodes of TFSCs in terms of electrical and optical properties. Moreover, the films exhibited good texturing potential based on etching studies with diluted HCl, which yielded an improved light trapping capability without significant degradation in electrical propreties. It is therefore suggested that the surface-textured GZO films prepared via PDMS and etching are promising candidates for indium-free transparent electrodes for TFSCs. (C) 2011 Elsevier B. V. All rights reserved.
引用
收藏
页码:834 / 838
页数:5
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