The influence of vicinal SrTiO3 surfaces on the growth and ferroelectric properties of epitaxial Bi4Ti3O12 thin films

被引:9
|
作者
Theis, CD
Yeh, J
Schlom, DG [1 ]
Hawley, ME
Brown, GW
机构
[1] Penn State Univ, Dept Mat Sci & Engn, University Pk, PA 16802 USA
[2] Los Alamos Natl Lab, Ctr Mat Sci, Los Alamos, NM 87545 USA
关键词
Bi4Ti3O12; epitaxy; vicinal; oxide MBE; ferroelectric;
D O I
10.1016/S0921-5107(98)00244-X
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Adsorption-controlled growth conditions have been utilized to grow epitaxial, stoichiometric, c-axis oriented Bi4Ti3O12 thin films by reactive molecular beam epitaxy (MBE). We have studied samples grown on vicinal (miscut) and well-oriented (100) SrTiO3 substrates. There is a degradation in film properties as a function of step density (degree of miscut) on the SrTiO3 surface. The greater the degree of miscut of the SrTiO3, substrate, the less intense the X-ray diffraction peak intensities of the film become, and the wider are the rocking curve widths. The reduced film quality is further confirmed by ferroelectric hysteresis measurements. Films grown on miscut substrates have significant space charge contributions to the polarization, while films grown on well-oriented substrates show symmetric hysteresis loops with remanent polarizations approaching values obtained for bulk single crystals. The degradation of film properties is explained by considering the influence of steps at the SrTiO3, substrate surface on the electronic and crystallographic continuity in the ab plane of the deposited Bi4Ti3O12 films. (C) 1998 Published by Elsevier Science S.A. All rights reserved.
引用
收藏
页码:228 / 233
页数:6
相关论文
共 50 条
  • [31] RAPID THERMALLY PROCESSED FERROELECTRIC BI4TI3O12 THIN-FILMS
    JOSHI, PC
    KRUPANIDHI, SB
    MANSINGH, A
    JOURNAL OF APPLIED PHYSICS, 1992, 72 (11) : 5517 - 5519
  • [32] Ferroelectric characteristics of silicate-bound Bi4Ti3O12 thin films
    Kato, K
    Suzuki, K
    Tanaka, K
    Fu, D
    Nishizawa, K
    Miki, T
    Ishiwara, H
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2005, 80 (02): : 271 - 273
  • [33] Ferroelectric properties of epitaxial Bi4Ti3O12 films deposited on epitaxial (100) Ir and (100) Pt films on Si by sputtering
    Horita, S
    Sasaki, S
    Kitagawa, O
    Horii, S
    VACUUM, 2002, 66 (3-4) : 427 - 433
  • [34] Ferroelectric Properties and Microstructures of Tb4O7-Doped Bi4Ti3O12 Thin Films
    Mei, X. A.
    Chen, M.
    Cai, A. H.
    Su, K. L.
    Huang, C. Q.
    Wan, Z. M.
    CHINESE CERAMICS COMMUNICATIONS, 2010, 105-106 : 259 - 262
  • [35] SWITCHING, FATIGUE, AND RETENTION IN FERROELECTRIC BI4TI3O12 THIN-FILMS
    JOSHI, PC
    KRUPANIDHI, SB
    APPLIED PHYSICS LETTERS, 1993, 62 (16) : 1928 - 1930
  • [36] Ferroelectric Properties and Microstructures of Tb4O7-doped Bi4Ti3O12 Thin Films
    Liu, R. F.
    Mei, X. A.
    Chen, M.
    Huang, C. Q.
    Liu, J.
    HIGH-PERFORMANCE CERAMICS VII, PTS 1 AND 2, 2012, 512-515 : 1325 - 1328
  • [37] Relaxation of ferroelectric domains in epitaxial BiFeO3 thin films on vicinal SrTiO3 substrate
    Jang, Y. H.
    Kim, C. H.
    Seo, S. J.
    Cho, J. H.
    THIN SOLID FILMS, 2013, 548 : 52 - 57
  • [38] Nanoskyscrapers of ferroelectric Bi4Ti3O12
    Takahashi, R
    Yonezawa, Y
    Nakajima, K
    Chikyow, T
    Koinuma, H
    Matsumoto, Y
    APPLIED PHYSICS LETTERS, 2006, 88 (15)
  • [39] Epitaxial growth of Bi4Ti3O12/CeO2/Ce0.12Zr0.88O2 and Bi4Ti3O12/SrTiO3/Ce0.12Zr0.88O2 thin films on Si and its application to metal-ferroelectric-insulator-semiconductor diodes
    Migita, Shinji
    Xiong, Si-Bei
    Sakamaki, Kazuo
    Ota, Hiroyuki
    Tarui, Yasuo
    Sakai, Shigeki
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2000, 39 (9 B): : 5505 - 5511
  • [40] Epitaxial growth of Bi4Ti3O12/CeO2/Ce0.12Zr0.88O2 and Bi4Ti3O12/SrTiO3/Ce0.12Zr0.88O2 thin films on Si and its application to metal-ferroelectric-insulator-semiconductor diodes
    Migita, S
    Xiong, SB
    Sakamaki, K
    Ota, H
    Tarui, Y
    Sakai, S
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2000, 39 (9B): : 5505 - 5511