Patterned Quantum Dot Molecule Laser Fabricated by Electron Beam Lithography and Wet Chemical Etching

被引：0
|
作者：
Verma, V. B. [1 ]
Reddy, U. [1 ]
Dias, N. L. [1 ]
Bassett, K. P. [1 ]
Li, X. [1 ]
Coleman, J. J. [1 ]
机构：
[1] Univ Illinois, Dept Elect & Comp Engn, Urbana, IL 61801 USA
来源：
2010 IEEE PHOTONICS SOCIETY WINTER TOPICALS MEETING SERIES | 2010年
关键词：
D O I：
10.1109/PHOTWTM.2010.5421923
中图分类号：
TP301 [理论、方法];
学科分类号：
081202 ;
摘要：
引用
收藏
页码：143 / 144
页数：2
相关论文
共 50 条
  • [41] Site-controlled InAs single quantum-dot structures on GaAs surfaces patterned by in situ electron-beam lithography
    Ishikawa, T
    Nishimura, T
    Kohmoto, S
    Asakawa, K
    APPLIED PHYSICS LETTERS, 2000, 76 (02) : 167 - 169
  • [42] Photoluminescence characteristics of GaAs/AlGaAs quantum dot arrays fabricated by dry and dry-wet etching
    Wang, XH
    Song, AM
    Liu, J
    Cheng, WC
    Li, GH
    Li, CF
    Li, YX
    Yu, JZ
    PHOTONICS TECHNOLOGY INTO THE 21ST CENTURY: SEMICONDUCTORS, MICROSTRUCTURES, AND NANOSTRUCTURES, 1999, 3899 : 147 - 152
  • [43] Interference Lithography Patterned Nanogratings in LiNbO3 Fabricated by Dry Etching
    Gu, Qiongchan
    Jiang, Xiaoxiao
    Lv, Jiangtao
    Si, Guangyuan
    MODERN TECHNOLOGIES IN MATERIALS, MECHANICS AND INTELLIGENT SYSTEMS, 2014, 1049 : 7 - 10
  • [44] 10 NM SI PILLARS FABRICATED USING ELECTRON-BEAM LITHOGRAPHY, REACTIVE ION ETCHING, AND HF ETCHING
    FISCHER, PB
    DAI, K
    CHEN, E
    CHOU, SY
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (06): : 2524 - 2527
  • [45] DOT MATRIX ELECTRON-BEAM LITHOGRAPHY
    NEWMAN, TH
    PEASE, RFW
    DEVORE, W
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04): : 999 - 1002
  • [46] Biomolecular patterned surfaces by electron beam lithography.
    Senaratne, W
    Sengupta, P
    Jakubek, V
    Baird, B
    Ober, CK
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2004, 228 : U445 - U445
  • [47] ZnCdSe/ZnSe quantum well wires fabricated by reactive ion etching and wet chemical treatment
    Gurevich, SA
    Lavrova, OA
    Lomasov, NV
    Nesterov, SI
    Skopina, VI
    Tanklevskaya, EM
    Travnikov, VV
    Osinsky, A
    Qiu, Y
    Temkin, H
    Rabe, M
    Henneberger, F
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1998, 13 (01) : 139 - 141
  • [48] Fabrication of narrow-striped InAs/GaAs quantum dot laser with wet etching technique
    Li, S. G.
    Gong, Q.
    Cao, C. F.
    Wang, X. Z.
    Xia, L. Z.
    Yan, J. Y.
    Wang, Y.
    JOURNAL OF MODERN OPTICS, 2013, 60 (12) : 1015 - 1020
  • [49] Junction Depth Estimation using Wet Chemical Etching for Deep Junction Fabricated by Laser Doping
    Mondal, Som
    Bajpai, Vishnu Kant
    Solanki, Chetan Singh
    2013 IEEE 39TH PHOTOVOLTAIC SPECIALISTS CONFERENCE (PVSC), 2013, : 1441 - 1444
  • [50] Patterned negative electron affinity photocathodes for maskless electron beam lithography
    Schneider, JE
    Sen, P
    Pickard, DS
    Winograd, GI
    McCord, MA
    Pease, RFW
    Spicer, WE
    Baum, AW
    Costello, KA
    Davis, GA
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (06): : 3192 - 3196
12345