Area selective atomic layer deposition for advanced nanofabrication

被引：0
|
作者：
Bent, Stacey [1 ]
机构：
[1] Dept Chem Engn, Stanford, CA USA
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2019年 / 258卷
关键词：
D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
128-PMSE
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收藏
页数：1
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