Low-damage processing using size-controlled gas cluster ion beams

被引：4

作者：

Toyoda, Noriaki ^{[1
]}

Yamada, Isao ^{[1
]}

机构：

[1] Univ Hyogo, Lab Adv Sci & Technol Ind, Kamigori, Hyogo 6781205, Japan

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2007年 / 261卷 / 1-2期

关键词：

cluster ion; size selection; damage; crater formation;

D O I：

10.1016/j.nimb.2007.04.107

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Gas cluster ion beam (GCIB) process has been used as a novel technique to realize very low-damage irradiations. The energy per atom of cluster ions can be reduced down to several eV/atom at several keV of total acceleration energy. In this study, size-controlled GCIB was formed using a strong permanent magnet, subsequently low-damage characteristics of large cluster ion irradiations were evaluated from the cross-sectional transmission electron microscope (TEM) observations of Si substrates. After size-controlled GCIB irradiation, the damaged or modified layer thickness was below several nm, when total acceleration energy was 5 keV and Ar cluster size was larger than 5000. Result obtained from spectroscopic ellipsometry also indicated the possibility of low-damage processing by size-controlled GCIB. (c) 2007 Elsevier B.V. All rights reserved.

引用

页码：643 / 646

页数：4

共 50 条

[21] Low-damage milling of an amino acid thin film with cluster ion beam
Hada, Masaki
Ibuki, Sachi
Hontani, Yusaku
Yamamoto, Yasuyuki
Ichiki, Kazuya
Ninomiya, Satoshi
Seki, Toshio
Aoki, Takaaki
Matsuo, Jiro
JOURNAL OF APPLIED PHYSICS, 2011, 110 (09)
[22] Cluster size effects of gas cluster ion beams on surface modification
Toyoda, N.
Yamada, I.
ION IMPLANTATION TECHNOLOGY, 2006, 866 : 210 - +
[23] Cluster Size Dependence of Etching by Reactive Gas Cluster Ion Beams
Toyoda, Noriaki
Yamada, Iaso
ION IMPLANTATION TECHNOLOGY 2008, 2008, 1066 : 427 - 430
[24] Nanoscale processing by gas cluster ion beams - Novel technique in ion beam processing
Yamada, I
Matsuo, J
THIRD INTERNATIONAL CONFERENCE ON INTELLIGENT MATERIALS - THIRD EUROPEAN CONFERENCE ON SMART STRUCTURES AND MATERIALS, 1996, 2779 : 759 - 764
[25] Characteristics and peculiarities of surface processing by gas cluster ion beams
Kyoto Univ, Kyoto, Japan
Nucl Instrum Methods Phys Res Sect B, 1-4 (242-247):
[26] Characteristics and peculiarities of surface processing by gas cluster ion beams
Yamada, I
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1996, 112 (1-4): : 242 - 247
[27] Novel materials processing and applications by gas cluster ion beams
Yamada, I
EUROPEAN PHYSICAL JOURNAL D, 1999, 9 (1-4): : 55 - 61
[28] Cluster size dependences of bombardment effects using mass-selected gas cluster ion beams
Nakamura, Kazuhiro
Houzumi, Shingo
Toyoda, Noriaki
Mochiji, Kozo
Mitamura, Toru
Yamada, Isao
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2007, 261 (1-2): : 660 - 663
[29] Surface processing using water cluster ion beams
Takaoka, Gikan H.
Ryuto, Hiromichi
Takeuchi, Mitsuaki
Ichihashi, Gaku
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2013, 307 : 33 - 36
[30] Low-Damage and High-Rate Sputtering of Silicon Surfaces by Ethanol Cluster Ion Beam
Ryuto, Hiromichi
Sugiyama, Kazumichi
Ozaki, Ryosuke
Takaoka, Gikan H.
APPLIED PHYSICS EXPRESS, 2009, 2 (01) : 0165041 - 0165043

← 1 2 3 4 5 →