Low-damage processing using size-controlled gas cluster ion beams

被引：4
|
作者：
Toyoda, Noriaki [1 ]
Yamada, Isao [1 ]
机构：
[1] Univ Hyogo, Lab Adv Sci & Technol Ind, Kamigori, Hyogo 6781205, Japan
来源：
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2007年 / 261卷 / 1-2期
关键词：
cluster ion; size selection; damage; crater formation;
D O I：
10.1016/j.nimb.2007.04.107
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
Gas cluster ion beam (GCIB) process has been used as a novel technique to realize very low-damage irradiations. The energy per atom of cluster ions can be reduced down to several eV/atom at several keV of total acceleration energy. In this study, size-controlled GCIB was formed using a strong permanent magnet, subsequently low-damage characteristics of large cluster ion irradiations were evaluated from the cross-sectional transmission electron microscope (TEM) observations of Si substrates. After size-controlled GCIB irradiation, the damaged or modified layer thickness was below several nm, when total acceleration energy was 5 keV and Ar cluster size was larger than 5000. Result obtained from spectroscopic ellipsometry also indicated the possibility of low-damage processing by size-controlled GCIB. (c) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码：643 / 646
页数：4
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