tunnel magnetoresistance;
magnetic tunnel junction;
spin-polarization;
MRAM;
Co60Fe20B20;
D O I:
暂无
中图分类号:
T [工业技术];
学科分类号:
08 ;
摘要:
Single barrier magnetic-tunnel-junctions (MTJs) with the layer structure of Ta(5)/Cu(30)/Ta(5)/Ni79Fe21(5)/Ir-22 Mn-78(12)/Co60Fe20B20(4)/Al(0.8)-oxide/Co60Fe20B20(4)/Cu(30)/Ta(5) [thickness unit: nm] using the amorphous Co60Fe20B20 alloy as free and pinned layers were micro-fabricated. The experimental investigations showed that the tunnel magnetoresistance (TMR) ratio and the resistance decrease with increasing dc bias voltage from 0 to 500 mV or with increasing temperature from 4.2 K to RT. A high TMR ratio of 86.2% at 4.2 K, which corresponds to the high spin polarization Of Co60Fe20B20, 55%, was observed in the MTJs after annealing at 270 degrees C for 1 h. High TMR ratio of 53.1%, low junction resistance-area product RS of 3.56 k Omega/mu m(2), small coercivity H-C of <= 4 Oe, and relatively large bias-voltage-at-half-maximum TMR with the value V-1/2 of greater than 570 mV at RT have been achieved in such Co-Fe-B MTJs.
机构:
Indian Inst Technol Delhi, Dept Phys, Thin Film Lab, New Delhi 110016, IndiaIndian Inst Technol Delhi, Dept Phys, Thin Film Lab, New Delhi 110016, India
Gupta, Nanhe Kumar
Kumar, Amar
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Indian Inst Technol Delhi, Dept Phys, Thin Film Lab, New Delhi 110016, IndiaIndian Inst Technol Delhi, Dept Phys, Thin Film Lab, New Delhi 110016, India
Kumar, Amar
Hait, Soumyarup
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Indian Inst Technol Delhi, Dept Phys, Thin Film Lab, New Delhi 110016, IndiaIndian Inst Technol Delhi, Dept Phys, Thin Film Lab, New Delhi 110016, India
Hait, Soumyarup
Pandey, Lalit
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Indian Inst Technol Delhi, Dept Phys, Thin Film Lab, New Delhi 110016, IndiaIndian Inst Technol Delhi, Dept Phys, Thin Film Lab, New Delhi 110016, India
Pandey, Lalit
Barwal, Vineet
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Indian Inst Technol Delhi, Dept Phys, Thin Film Lab, New Delhi 110016, India
Natl Inst Mat Sci NIMS, Ctr Magnet & Spintron Mat CMSM, 1-2-1 Sengen, Tsukuba, Ibaraki 3050047, JapanIndian Inst Technol Delhi, Dept Phys, Thin Film Lab, New Delhi 110016, India
Barwal, Vineet
Mishra, Vireshwar
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Indian Inst Technol Delhi, Dept Phys, Thin Film Lab, New Delhi 110016, IndiaIndian Inst Technol Delhi, Dept Phys, Thin Film Lab, New Delhi 110016, India
Mishra, Vireshwar
Sharma, Nikita
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Indian Inst Technol Delhi, Dept Phys, Thin Film Lab, New Delhi 110016, IndiaIndian Inst Technol Delhi, Dept Phys, Thin Film Lab, New Delhi 110016, India
Sharma, Nikita
Kumar, Nakul
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Indian Inst Technol Delhi, Dept Phys, Thin Film Lab, New Delhi 110016, IndiaIndian Inst Technol Delhi, Dept Phys, Thin Film Lab, New Delhi 110016, India
Kumar, Nakul
Husain, Sajid
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Indian Inst Technol Delhi, Dept Phys, Thin Film Lab, New Delhi 110016, India
Lawrence Berkeley Natl Lab, Mat Phys Div, Berkeley, CA 94720 USAIndian Inst Technol Delhi, Dept Phys, Thin Film Lab, New Delhi 110016, India
Husain, Sajid
Chaudhary, Sujeet
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Indian Inst Technol Delhi, Dept Phys, Thin Film Lab, New Delhi 110016, IndiaIndian Inst Technol Delhi, Dept Phys, Thin Film Lab, New Delhi 110016, India