Resonant scheme for interferometric lithography improves spatial resolution beyond diffraction limit

被引：0
|
作者：
Carvajal, Joan J.
机构：
来源：
MRS BULLETIN | 2008年 / 33卷 / 05期
关键词：
D O I：
10.1557/mrs2008.95
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
[No abstract available]
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收藏
页码：492 / 492
页数：1
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