Studies on Nanocrystalline Nickel Oxide Thin Films for Potential Applications

被引：0
|
作者：
Sagadevana, Suresh [1 ]
Rajesh, S. [2 ]
Das, Isha [3 ]
机构：
[1] AMET Univ, Dept Phys, Madras 603112, Tamil Nadu, India
[2] Tagore Engn Coll, Dept Mech Engn, Madras 6000127, Tamil Nadu, India
[3] Holy Mary Inst Sci & Technol, Dept ECE, Hyderabad, Andhra Pradesh, India
来源：
MATERIALS TODAY-PROCEEDINGS | 2017年 / 4卷 / 02期
关键词：
NiO thin Films; XRD; SEM; UV analysis and Dielectric studies; ELECTROCHROMIC PROPERTIES; DEPOSITION;
D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Nickel oxide (NiO) thin films were prepared by Chemical Bath Deposition (CBD) method. X-ray diffraction (XRD) analysis was used to study the structure and crystallite size of NiO thin film. The surface morphology was studied using scanning electron microscopy (SEM). The optical properties were studied using the UV-Visible spectrum. The dielectric properties of NiO thin films were studied at different frequencies and different temperatures. (C) 2017 Elsevier Ltd. All rights reserved.
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页码：4123 / 4129
页数：7
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