Low Frequency Noise Modeling and SPICE Implementation of Nanoscale MOSFETs

被引:1
|
作者
Lee, Jonghwan [1 ]
机构
[1] Sangmyung Univ, Dept Syst Semicond Engn, 31 Sangmyungdae Gil, Cheonan 31066, Chungnam, South Korea
关键词
Gate leakage current noise; drain current noise; nanoscale MOSFETs; ultrathin gate oxides; cross correlation effects; quantum-mechanical effects; BSIM; GATE-LEAKAGE CURRENT; SHOT-NOISE; OXIDE;
D O I
10.5573/JSTS.2021.21.1.039
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The physics-based compact gate and drain current noise models of nanoscale MOSFETs at low frequencies are presented. The models are primarily developed to be implemented in circuit simulators and are further applied to gain insight into the noise behavior of advanced MOSFETs. For a comprehensive evaluation of noise performance at low frequencies, the models describe all the important physical noise sources and effects which are observed in nanoscale MOSFETs with ultrathin gate oxides. The models account for the gate leakage current noise, the drain current noise, cross correlation effects between the gate and the drain, and quantum mechanical (QM) effects in the inversion layer. With the help of an accurate and generally applicable compact noise models, the compact noise models are successfully implemented into BSIM (Berkeley Short-channel IGFET Model) format and are validated through a comparison of simulation results and measurements.
引用
收藏
页码:39 / 48
页数:10
相关论文
共 50 条
  • [31] Issues in high-frequency noise characterization and modeling of MOSFETs
    Chen, Chih-Hung
    2005 IEEE INTERNATIONAL WORKSHOP ON RADIO-FREQUENCY INTEGRATION TECHNOLOGY, PROCEEDINGS: INTEGRATED CIRCUITS FOR WIDEBAND COMMUNICATION AND WIRELESS SENSOR NETWORKS, 2005, : 119 - 122
  • [32] Low-Frequency Noise Reduction in Si Nanowire MOSFETs
    Ohmori, K.
    Feng, W.
    Hettiarachchi, R.
    Lee, Y.
    Sato, S.
    Kakushima, K.
    Sato, M.
    Fukuda, K.
    Niwa, M.
    Yamabe, K.
    Shiraishi, K.
    Iwai, H.
    Yamada, K.
    DIELECTRICS FOR NANOSYSTEMS 5: MATERIALS SCIENCE, PROCESSING, RELIABILITY, AND MANUFACTURING -AND-TUTORIALS IN NANOTECHNOLOGY: MORE THAN MOORE - BEYOND CMOS EMERGING MATERIALS AND DEVICES, 2012, 45 (03): : 437 - 442
  • [33] Low frequency noise in sub-100 nm MOSFETs
    Kramer, TA
    Pease, RFW
    PHYSICA E-LOW-DIMENSIONAL SYSTEMS & NANOSTRUCTURES, 2003, 19 (1-2): : 13 - 17
  • [34] Impact of latch phenomenon on low frequency noise in SOI MOSFETs
    Jomaah, J
    Balestra, F
    MICROELECTRONICS RELIABILITY, 1998, 38 (04) : 567 - 570
  • [35] Low frequency noise and technology induced mechanical stress in MOSFETs
    Fantini, Paolo
    Ferrari, Giorgio
    MICROELECTRONICS RELIABILITY, 2007, 47 (08) : 1218 - 1221
  • [36] Low frequency noise characterization and modelling in ultrathin oxide MOSFETs
    Contaret, T
    Romanjek, K
    Boutchacha, T
    Ghibaudo, G
    Boeuf, F
    SOLID-STATE ELECTRONICS, 2006, 50 (01) : 63 - 68
  • [37] Investigation of Low-Frequency Noise in Silicon Nanowire MOSFETs
    Zhuge, Jing
    Wang, Runsheng
    Huang, Ru
    Tian, Yu
    Zhang, Liangliang
    Kim, Dong-Won
    Park, Donggun
    Wang, Yangyuan
    IEEE ELECTRON DEVICE LETTERS, 2009, 30 (01) : 57 - 60
  • [38] Low Frequency Noise in 4H-SiC MOSFETs
    Rumyantsev, Sergey L.
    Shur, Michael S.
    Levinshtein, Michael E.
    Ivanov, Pavel A.
    Palmour, John W.
    Das, Mrinal K.
    Hull, Brett A.
    SILICON CARBIDE AND RELATED MATERIALS 2008, 2009, 615-617 : 817 - 820
  • [39] Low-frequency noise in nanoscale ballistic transistors
    Tersoff, J.
    NANO LETTERS, 2007, 7 (01) : 194 - 198
  • [40] Modeling Local Variation of Low-Frequency Noise in MOSFETs via Sum of Lognormal Random Variables
    Yu, Bo
    Li, Xin
    Yonemura, James
    Wu, Zhiyuan
    Goo, Jung-Suk
    Thuruthiyil, Ciby
    Icel, Ali
    2012 IEEE CUSTOM INTEGRATED CIRCUITS CONFERENCE (CICC), 2012,