Ambipolar transport in tin dioxide thin film transistors promoted by PCBM fullerene

被引:6
|
作者
Boratto, Miguel H. [1 ,2 ,3 ]
Scalvi, Luis V. A. [2 ]
Goncharova, Lyudmila V. [3 ,4 ]
Fanchini, Giovanni [3 ,4 ,5 ]
机构
[1] Fed Univ Santa Catarina UFSC, Postgrad Program Phys, Dept Phys, BR-88040900 Florianopolis, SC, Brazil
[2] Sao Paulo State Univ UNESP, POSMAT Postgrad Program Mat Sci & Technol, Dept Phys, Sch Sci, BR-17033360 Bauru, SP, Brazil
[3] Univ Western Ontario, Dept Phys & Astron, London, ON N6A 3K7, Canada
[4] Univ Western Ontario, CAMBR, London, ON N6A 5B7, Canada
[5] Univ Western Ontario, Dept Chem, London, ON N6A 5B7, Canada
基金
加拿大创新基金会; 加拿大自然科学与工程研究理事会;
关键词
FIELD-EFFECT TRANSISTORS; PERFORMANCE; HETEROJUNCTION; TRANSPARENT; SURFACE;
D O I
10.1007/s10854-018-0131-9
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this article, the effect of phenyl-C-61-butyric acid methyl ester (PCBM) layer on the electrical performance of field-effect transistors (FETs) based on antimony-doped tin dioxide (Sb:SnO2) is reported. PCBM is a soluble variety of fullerene, n-type organic semiconductor, known to promote the p-type doping of semiconducting materials such as diamond and graphene, via charge transfer. Sb:SnO2 is an emerging low-cost transparent oxide semiconductor material that exhibits strong unipolar behavior (n-type). Ambipolar character in tin dioxide normally is not observed, however in this study we find that the deposition of PCBM on top of Sb:SnO2 promotes ambipolar behavior in Sb:SnO2 FETs. At negative gate bias (V-G<0) PCBM traps free electrons from the conduction band of SnO2 and from Sb donors, thus downshifting the Sb:SnO2 Fermi level (E-F), leading to a strong injection of holes in the valence band of Sb:SnO2. The p-type carrier concentration increases up to 8.6x10(11)cm(-2). Our results suggest that PCBM deposition decreases the current in the accumulation mode of electrons due to electron mobility decrease at V-G>0, and enhances the current in inversion mode. Besides, PCBM deposition also results in an increase of hole mobility at V-G<0.
引用
收藏
页码:20010 / 20016
页数:7
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