Modulation of strain, resistance, and capacitance of tantalum oxide film by converse piezoelectric effect
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作者:
Jia, Yanmin
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Zhejiang Normal Univ, Dept Phys, Jinhua 321004, Peoples R ChinaZhejiang Normal Univ, Dept Phys, Jinhua 321004, Peoples R China
Jia, Yanmin
[1
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Tian, Xiangling
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Zhejiang Normal Univ, Dept Phys, Jinhua 321004, Peoples R ChinaZhejiang Normal Univ, Dept Phys, Jinhua 321004, Peoples R China
Tian, Xiangling
[1
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Si, Jianxiao
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Zhejiang Normal Univ, Dept Phys, Jinhua 321004, Peoples R ChinaZhejiang Normal Univ, Dept Phys, Jinhua 321004, Peoples R China
Si, Jianxiao
[1
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Huang, Shihua
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Zhejiang Normal Univ, Dept Phys, Jinhua 321004, Peoples R ChinaZhejiang Normal Univ, Dept Phys, Jinhua 321004, Peoples R China
Huang, Shihua
[1
]
Wu, Zheng
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机构:
Zhejiang Normal Univ, Coll Geog & Environm Sci, Jinhua 321004, Peoples R China
China Univ Geosci, Sch Mat Sci & Technol, Beijing 100083, Peoples R ChinaZhejiang Normal Univ, Dept Phys, Jinhua 321004, Peoples R China
Wu, Zheng
[2
,3
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Zhu, Chenchen
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Univ Bristol, Fac Engn, ACCIS Grp, Bristol BS8 1TH, Avon, EnglandZhejiang Normal Univ, Dept Phys, Jinhua 321004, Peoples R China
Zhu, Chenchen
[4
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机构:
[1] Zhejiang Normal Univ, Dept Phys, Jinhua 321004, Peoples R China
[2] Zhejiang Normal Univ, Coll Geog & Environm Sci, Jinhua 321004, Peoples R China
[3] China Univ Geosci, Sch Mat Sci & Technol, Beijing 100083, Peoples R China
[4] Univ Bristol, Fac Engn, ACCIS Grp, Bristol BS8 1TH, Avon, England
We deposited tantalum oxide film on a laminate structure composed of a Si substrate and a piezoelectric 0.72Pb(Mg1/3Nb2/3)O-3-0.28PbTiO(3) single crystal and achieved in situ modulation of the resistance and capacitance of the Ta2O5 film. The modulation arises from the induced lattice strain in the Ta2O5 film, which is induced by the electric-field-induced strain in the piezoelectric crystal. Under an external electric field of similar to 2 kV/cm, the longitudinal gauge factor of the Ta2O5 film is similar to 3300. The control of the strain using the converse piezoelectric effect may be further extended to tune the intrinsic strain of other oxide thin films. (C) 2011 American Institute of Physics. [doi: 10.1063/1.3609012]
机构:
Univ Nova Lisboa, Fac Sci & Technol, CENIMAT, Dept Mat Sci, P-2829516 Caparica, PortugalUniv Nova Lisboa, Fac Sci & Technol, CENIMAT, Dept Mat Sci, P-2829516 Caparica, Portugal
Fortunato, E
Nunes, P
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机构:Univ Nova Lisboa, Fac Sci & Technol, CENIMAT, Dept Mat Sci, P-2829516 Caparica, Portugal
Nunes, P
Marques, A
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Marques, A
Costa, D
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机构:Univ Nova Lisboa, Fac Sci & Technol, CENIMAT, Dept Mat Sci, P-2829516 Caparica, Portugal
Costa, D
Aguas, H
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机构:Univ Nova Lisboa, Fac Sci & Technol, CENIMAT, Dept Mat Sci, P-2829516 Caparica, Portugal
Aguas, H
Ferreira, I
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机构:Univ Nova Lisboa, Fac Sci & Technol, CENIMAT, Dept Mat Sci, P-2829516 Caparica, Portugal
Ferreira, I
da Costa, MEV
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da Costa, MEV
Godinho, MH
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Godinho, MH
Almeida, PL
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Almeida, PL
Borges, JP
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机构:Univ Nova Lisboa, Fac Sci & Technol, CENIMAT, Dept Mat Sci, P-2829516 Caparica, Portugal
Borges, JP
Martins, R
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机构:Univ Nova Lisboa, Fac Sci & Technol, CENIMAT, Dept Mat Sci, P-2829516 Caparica, Portugal
机构:
Sun Yat Sen Univ, Sch Phys & Engn, Micronano Phys & Mech Res Lab, State Key Lab Optoelect Mat & Technol,Inst Optoel, Guangzhou 510275, Guangdong, Peoples R ChinaSun Yat Sen Univ, Sch Phys & Engn, Micronano Phys & Mech Res Lab, State Key Lab Optoelect Mat & Technol,Inst Optoel, Guangzhou 510275, Guangdong, Peoples R China
Zhang, Genghong
Luo, Xin
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Sun Yat Sen Univ, Sch Phys & Engn, Micronano Phys & Mech Res Lab, State Key Lab Optoelect Mat & Technol,Inst Optoel, Guangzhou 510275, Guangdong, Peoples R China
Inst High Performance Comp, Singapore 138632, SingaporeSun Yat Sen Univ, Sch Phys & Engn, Micronano Phys & Mech Res Lab, State Key Lab Optoelect Mat & Technol,Inst Optoel, Guangzhou 510275, Guangdong, Peoples R China
Luo, Xin
Zheng, Yue
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Sun Yat Sen Univ, Sch Phys & Engn, Micronano Phys & Mech Res Lab, State Key Lab Optoelect Mat & Technol,Inst Optoel, Guangzhou 510275, Guangdong, Peoples R ChinaSun Yat Sen Univ, Sch Phys & Engn, Micronano Phys & Mech Res Lab, State Key Lab Optoelect Mat & Technol,Inst Optoel, Guangzhou 510275, Guangdong, Peoples R China
Zheng, Yue
Wang, Biao
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Sun Yat Sen Univ, Sch Phys & Engn, Micronano Phys & Mech Res Lab, State Key Lab Optoelect Mat & Technol,Inst Optoel, Guangzhou 510275, Guangdong, Peoples R ChinaSun Yat Sen Univ, Sch Phys & Engn, Micronano Phys & Mech Res Lab, State Key Lab Optoelect Mat & Technol,Inst Optoel, Guangzhou 510275, Guangdong, Peoples R China
机构:
Hong Kong Polytech Univ, Dept Appl Phys, Hong Kong, Hong Kong, Peoples R ChinaHong Kong Polytech Univ, Dept Appl Phys, Hong Kong, Hong Kong, Peoples R China
Zheng, R. K.
Wang, J.
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机构:Hong Kong Polytech Univ, Dept Appl Phys, Hong Kong, Hong Kong, Peoples R China
Wang, J.
Zhou, X. Y.
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机构:Hong Kong Polytech Univ, Dept Appl Phys, Hong Kong, Hong Kong, Peoples R China
Zhou, X. Y.
Wang, Y.
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机构:Hong Kong Polytech Univ, Dept Appl Phys, Hong Kong, Hong Kong, Peoples R China
Wang, Y.
Chan, H. L. W.
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机构:Hong Kong Polytech Univ, Dept Appl Phys, Hong Kong, Hong Kong, Peoples R China
Chan, H. L. W.
Choy, C. L.
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机构:Hong Kong Polytech Univ, Dept Appl Phys, Hong Kong, Hong Kong, Peoples R China
Choy, C. L.
Luo, H. S.
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机构:Hong Kong Polytech Univ, Dept Appl Phys, Hong Kong, Hong Kong, Peoples R China
机构:
Korea Inst Sci & Technol, Interface Control Res Ctr, Future Convergence Res Div, Seoul 136791, South Korea
Hanyang Univ, Adv Semicond Res Ctr, Div Elect & Comp Engn, Seoul 133791, South KoreaKorea Inst Sci & Technol, Interface Control Res Ctr, Future Convergence Res Div, Seoul 136791, South Korea
No, Young Soo
Park, Dong-Hee
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Korea Inst Sci & Technol, Interface Control Res Ctr, Future Convergence Res Div, Seoul 136791, South KoreaKorea Inst Sci & Technol, Interface Control Res Ctr, Future Convergence Res Div, Seoul 136791, South Korea
Park, Dong-Hee
Lee, Jeon-Kook
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Korea Inst Sci & Technol, Interface Control Res Ctr, Future Convergence Res Div, Seoul 136791, South KoreaKorea Inst Sci & Technol, Interface Control Res Ctr, Future Convergence Res Div, Seoul 136791, South Korea
Lee, Jeon-Kook
Lee, Youn-Seoung
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机构:
Hanbat Natl Univ, Dept Commun Informat Engn, Taejon 305719, South KoreaKorea Inst Sci & Technol, Interface Control Res Ctr, Future Convergence Res Div, Seoul 136791, South Korea
Lee, Youn-Seoung
Kim, Tae Whan
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Hanyang Univ, Adv Semicond Res Ctr, Div Elect & Comp Engn, Seoul 133791, South KoreaKorea Inst Sci & Technol, Interface Control Res Ctr, Future Convergence Res Div, Seoul 136791, South Korea
Kim, Tae Whan
Choi, Won-Kook
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Korea Inst Sci & Technol, Interface Control Res Ctr, Future Convergence Res Div, Seoul 136791, South KoreaKorea Inst Sci & Technol, Interface Control Res Ctr, Future Convergence Res Div, Seoul 136791, South Korea