Properties of Amorphous Carbon Thin Films for Solar Cell Applications

被引：0
|
作者：
Mohamad, F. [1 ]
Hanib, N. M. [1 ]
Noor, U. M. [1 ]
Rusop, M. [1 ]
机构：
[1] Univ Teknol MARA, Fac Elect Engn, Solar Cell Lab, Shah Alam 40450, Selangor, Malaysia
来源：
INTERNATIONAL CONFERENCE ON ADVANCEMENT OF MATERIALS AND NANOTECHNOLOGY 2007 | 2010年 / 1217卷
关键词：
Amorphous carbon; Solar cells; Surface Morphology; Thermal CVD;
D O I：
10.1063/1.3377800
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
This paper is presented the properties of amorphous carbon (a-C) thin films for solar cell application. Amorphous carbon thin films have been deposited on silicon substrate by thermal chemical vapor deposition (thermal-CVD) method at various deposition temperatures. The surface morphology, electrical properties and crystallinity of these films have been studied using Analytical Scanning Electron Microscope (SEM) JEOL JSM-6360LA, Current Voltage (I-V) Measurement (Advantest R6243 DC Voltage Current Source/Monitor Software) and the D5000 Siemen Difractrometer (XRD) respectively. It was found that increasing deposition temperature had the most influence on the a-C thin films properties. In addition the carrier gas flow also showed a secondary impact on the properties of a-C thin films.
引用
收藏
页码：140 / 146
页数：7
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