Maskless Patterning of Vapor-Deposited Photosensitive Film and its Application to Organic Light-Emitting Diodes
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作者:
Muroyama, Masakazu
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Tokyo Univ Agr & Technol, Dept Organ & Polymer Mat Chem, Koganei, Tokyo 1848588, JapanTokyo Univ Agr & Technol, Dept Organ & Polymer Mat Chem, Koganei, Tokyo 1848588, Japan
Muroyama, Masakazu
[1
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Saito, Wataru
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Tokyo Univ Agr & Technol, Dept Organ & Polymer Mat Chem, Koganei, Tokyo 1848588, JapanTokyo Univ Agr & Technol, Dept Organ & Polymer Mat Chem, Koganei, Tokyo 1848588, Japan
Saito, Wataru
[1
]
Yokokura, Seiji
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Tokyo Univ Agr & Technol, Dept Organ & Polymer Mat Chem, Koganei, Tokyo 1848588, JapanTokyo Univ Agr & Technol, Dept Organ & Polymer Mat Chem, Koganei, Tokyo 1848588, Japan
Yokokura, Seiji
[1
]
Tanaka, Kuniaki
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Tokyo Univ Agr & Technol, Dept Organ & Polymer Mat Chem, Koganei, Tokyo 1848588, JapanTokyo Univ Agr & Technol, Dept Organ & Polymer Mat Chem, Koganei, Tokyo 1848588, Japan
Tanaka, Kuniaki
[1
]
Usui, Hiroaki
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Tokyo Univ Agr & Technol, Dept Organ & Polymer Mat Chem, Koganei, Tokyo 1848588, JapanTokyo Univ Agr & Technol, Dept Organ & Polymer Mat Chem, Koganei, Tokyo 1848588, Japan
Usui, Hiroaki
[1
]
机构:
[1] Tokyo Univ Agr & Technol, Dept Organ & Polymer Mat Chem, Koganei, Tokyo 1848588, Japan
Photosensitive thin films were prepared by the codeposition of a polymerizable monomer and a photoinitiator, which were patterned by UV irradiation followed by development in an organic solvent. This technique was applied for the preparation of a phosphorescent layer of an organic light emitting diode (OLED) by combining a vinylcarbazole monomer, a dopant of a vinyl derivative of a iridium complex, and a photoinitiator of a benzophenone derivative. An OLED with multiple emitting elements was prepared by repeating this patterning process. It was confirmed that the patterning does not cause harmful damage to the device characteristics. Moreover, the device characteristics can be improved after the photo patterning because the photopolymerization stabilizes the deposited films. This method is advantageous as a new technique for patterning polymer films without using a shadow mask for vapor deposition or a photoresist. (C) 2011 The Japan Society of Applied Physics
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Sony Corp, Adv Mat Labs, Kanagawa 2430021, Japan
Tokyo Univ Agr & Technol, Dept Organ & Polymer Mat Chem, Tokyo 1848588, JapanSony Corp, Adv Mat Labs, Kanagawa 2430021, Japan
Muroyama, Masakazu
Saito, Ichiro
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Sony Corp, Adv Mat Labs, Kanagawa 2430021, JapanSony Corp, Adv Mat Labs, Kanagawa 2430021, Japan
Saito, Ichiro
Yokokura, Seiji
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Tokyo Univ Agr & Technol, Dept Organ & Polymer Mat Chem, Tokyo 1848588, JapanSony Corp, Adv Mat Labs, Kanagawa 2430021, Japan
Yokokura, Seiji
Tanaka, Kuniaki
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Tokyo Univ Agr & Technol, Dept Organ & Polymer Mat Chem, Tokyo 1848588, JapanSony Corp, Adv Mat Labs, Kanagawa 2430021, Japan
Tanaka, Kuniaki
Usui, Hiroaki
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Tokyo Univ Agr & Technol, Dept Organ & Polymer Mat Chem, Tokyo 1848588, JapanSony Corp, Adv Mat Labs, Kanagawa 2430021, Japan
机构:
Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 08826, South Korea
Seoul Natl Univ, Res Inst Adv Mat, Seoul 08826, South KoreaSeoul Natl Univ, Dept Mat Sci & Engn, Seoul 08826, South Korea
Youn, Yong
Yoo, Dongsun
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Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 08826, South Korea
Seoul Natl Univ, Res Inst Adv Mat, Seoul 08826, South KoreaSeoul Natl Univ, Dept Mat Sci & Engn, Seoul 08826, South Korea
Yoo, Dongsun
Song, Hochul
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Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 08826, South Korea
Seoul Natl Univ, Res Inst Adv Mat, Seoul 08826, South KoreaSeoul Natl Univ, Dept Mat Sci & Engn, Seoul 08826, South Korea
Song, Hochul
Kang, Youngho
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Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 08826, South Korea
Seoul Natl Univ, Res Inst Adv Mat, Seoul 08826, South Korea
Korea Inst Mat Sci, Mat Modeling & Characterizat Dept, Chang Won 51508, South KoreaSeoul Natl Univ, Dept Mat Sci & Engn, Seoul 08826, South Korea
Kang, Youngho
Kim, Kye Yeop
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Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 08826, South Korea
Seoul Natl Univ, Res Inst Adv Mat, Seoul 08826, South Korea
LGE Yangjae R&D Campus, 38 Baumoe Ro, Seoul 06763, South KoreaSeoul Natl Univ, Dept Mat Sci & Engn, Seoul 08826, South Korea
Kim, Kye Yeop
Jeon, Sang Ho
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Samsung Display Co Ltd, Display R&D Ctr, 1 Samsung Ro, Yongin 17113, Gyeonggi Do, South KoreaSeoul Natl Univ, Dept Mat Sci & Engn, Seoul 08826, South Korea
Jeon, Sang Ho
Cho, Youngmi
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Samsung Display Co Ltd, Display R&D Ctr, 1 Samsung Ro, Yongin 17113, Gyeonggi Do, South KoreaSeoul Natl Univ, Dept Mat Sci & Engn, Seoul 08826, South Korea
Cho, Youngmi
Chae, Kyungchan
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Samsung Display Co Ltd, Display R&D Ctr, 1 Samsung Ro, Yongin 17113, Gyeonggi Do, South KoreaSeoul Natl Univ, Dept Mat Sci & Engn, Seoul 08826, South Korea
Chae, Kyungchan
Han, Seungwu
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Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 08826, South Korea
Seoul Natl Univ, Res Inst Adv Mat, Seoul 08826, South KoreaSeoul Natl Univ, Dept Mat Sci & Engn, Seoul 08826, South Korea