Electric properties of nanoscale contacts on Si(111) surfaces

被引:20
|
作者
Hasunuma, R [1 ]
Komeda, T
Tokumoto, H
机构
[1] Joint Res Ctr Atom Technol, Angstrom Technol Partnership, Tsukuba, Ibaraki 305, Japan
[2] Natl Inst Adv Interdisciplinary Res, Joint Res Ctr Atom Technol, Tsukuba, Ibaraki 305, Japan
关键词
STM; indentation; point contact; Si(111); Si wire; electric properties;
D O I
10.1016/S0169-4332(98)00030-0
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We have investigated the electric properties of nanoscale contacts on Si(111)-7 X 7 surfaces with a scanning tunneling microscope (STM). The contacts between a W STM tip and Si substrates exhibit Schottky-type rectification, whose properties are obviously different from the conventional plane diodes. The current variation during tip retraction from the contact region indicates the influence of Si atoms between the tip and substrates, as well as the contact size effects, which result from the Si atom removal with the present experimental technique. (C) 1998 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:84 / 89
页数:6
相关论文
共 50 条
  • [21] Redox Properties of Mixed Methyl/Vinylferrocenyl Monolayers on Si(111) Surfaces
    Lattimer, Judith R. C.
    Brunschwig, Bruce S.
    Lewis, Nathan S.
    Gray, Harry B.
    JOURNAL OF PHYSICAL CHEMISTRY C, 2013, 117 (51): : 27012 - 27022
  • [22] The interaction of carbon with Si(111):As and Si(111):H surfaces, a theoretical study
    Mutombo, P.
    Chab, V.
    SURFACE SCIENCE, 2009, 603 (04) : 590 - 596
  • [23] Size of small Si and Ge clusters on Si(111) and Ge(111) surfaces
    Asaoka, H
    Cherepanov, V
    Voigtländer, B
    SURFACE SCIENCE, 2005, 588 (1-3) : 19 - 25
  • [24] INTERACTION OF OXYGEN WITH SI (111) SURFACES
    ROVIDA, G
    ZANAZZI, E
    FERRONI, E
    SURFACE SCIENCE, 1972, 30 (03) : 707 - &
  • [25] HYDROGEN COVERED SI(111) SURFACES
    NARDELLI, MB
    FINOCCHI, F
    PALUMMO, M
    DIFELICE, R
    BERTONI, CM
    BERNARDINI, F
    OSSICINI, S
    SURFACE SCIENCE, 1992, 269 : 879 - 885
  • [26] TEM STUDY OF SI(111) SURFACES
    SATO, H
    TANISHIRO, Y
    YAGI, K
    APPLIED SURFACE SCIENCE, 1992, 60-1 : 367 - 371
  • [27] ELECTRONIC STATES OF SI(111) SURFACES
    HOUZAY, F
    GUICHAR, GM
    PINCHAUX, R
    PETROFF, Y
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 18 (03): : 860 - 865
  • [28] Steps on subliming Si(111) surfaces
    Homma, Y
    Finnie, P
    JOURNAL OF PHYSICS-CONDENSED MATTER, 1999, 11 (49) : 9879 - 9888
  • [29] CARBON CONTAMINATION OF SI(111) SURFACES
    CHARIG, JM
    SKINNER, DK
    SURFACE SCIENCE, 1969, 15 (02) : 277 - &
  • [30] INTERACTION OF OXYGEN WITH SI(111) SURFACES
    NISHIJIMA, M
    MUROTANI, T
    SURFACE SCIENCE, 1973, 39 (02) : 441 - 444