Optoelectronic properties analysis of silicon light-emitting diode monolithically integrated in standard CMOS IC

被引:48
|
作者
Chen, Yanxu [1 ]
Xu, Dongliang [1 ]
Xu, Kaikai [1 ]
Zhang, Ning [1 ]
Liu, Siyang [2 ]
Zhao, Jianming [1 ]
Luo, Qian [1 ]
Snyman, Lukas W. [3 ]
Swart, Jacobus W. [4 ]
机构
[1] Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Sichuan, Peoples R China
[2] Southeast Univ, Natl ASIC Syst Engn Res Ctr, Nanjing 210096, Jiangsu, Peoples R China
[3] Univ South Africa, Dept Elect Engn, ZA-0001 Pretoria, South Africa
[4] State Univ Campinas UNICAMP, Fac Elect & Comp Engn, BR-13083852 Campinas, SP, Brazil
基金
中国国家自然科学基金;
关键词
silicon light-emitting diode; reverse bias; electro-optic modulation; SI; ELECTROLUMINESCENCE; CAPACITANCE; DEVICE;
D O I
10.1088/1674-1056/ab3e44
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Si p(+)n junction diodes operating in the mode of avalanche breakdown are capable of emitting light in the visible range of 400-900 nm. In this study, to realize the switching speed in the GHz range, we present a transient model to shorten the carrier lifetime in the high electric field region by accumulating carriers in both p and n type regions. We also verify the optoelectronic characteristics by disclosing the related physical mechanisms behind the light emission phenomena. The emission of visible light by a monolithically integrated Si diode under the reverse bias is also discussed. The light is emitted as spatial sources by the defects located at the p n junction of the reverse-biased diode. The influence of the defects on the electrical behavior is manifested as a current-dependent electroluminescence.
引用
收藏
页数:6
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