Semiconductor fabrication -: Pushing deep ultraviolet lithography to its limits

被引：99
|
作者：
Totzeck, Michael [1 ]
Ulrich, Wilhelm [1 ]
Goehnermeier, Aksel [1 ]
Kaiser, Winfried [1 ]
机构：
[1] Carl Zeiss SMT, D-73446 Oberkochen, Germany
来源：
NATURE PHOTONICS | 2007年 / 1卷 / 11期
关键词：
D O I：
10.1038/nphoton.2007.218
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
[No abstract available]
引用
收藏
页码：629 / 631
页数：3
相关论文
共 50 条
  • [21] Hazards abatement in deep ultraviolet lithography
    Green, PG
    ILSC'99: PROCEEDINGS OF THE INTERNATIONAL LASER SAFETY CONFERENCE, 1999, 4 : 246 - 255
  • [22] Immersion liquids for lithography in the deep ultraviolet
    Switkes, M
    Kunz, RR
    Sinta, RF
    Rothschild, M
    Gallagher-Wetmore, PM
    Krukonis, VJ
    Williams, K
    OPTICAL MICROLITHOGRAPHY XVI, PTS 1-3, 2003, 5040 : 690 - 699
  • [23] ACHROMATIC HOLOGRAPHIC LITHOGRAPHY IN THE DEEP ULTRAVIOLET
    ANDERSON, EH
    KOMATSU, K
    SMITH, HI
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (01): : 216 - 218
  • [24] Pushing Higgs effective theory to its limits
    Brehmer, Johann
    Freitas, Ayres
    Lopez-Val, David
    Plehn, Tilman
    PHYSICAL REVIEW D, 2016, 93 (07)
  • [25] Enhancon solutions: Pushing supergravity to its limits
    Dimitriadis, A
    Peet, AW
    Potvin, G
    Ross, SF
    PHYSICAL REVIEW D, 2004, 70 (04):
  • [26] Pushing extreme ultraviolet lithography development beyond 22 nm half pitch
    Naulleau, Patrick P.
    Anderson, Christopher N.
    Baclea-an, Lorie-Mae
    Denham, Paul
    George, Simi
    Goldberg, Kenneth A.
    Goldstein, Michael
    Hoef, Brian
    Jones, Gideon
    Koh, Chawon
    La Fontaine, Bruno
    Montgomery, Warren
    Wallow, Tom
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2009, 27 (06): : 2911 - 2915
  • [27] Pushing Social Philosophy to Its Democratic Limits
    Hogan, Brendan
    CONTEMPORARY PRAGMATISM, 2021, 18 (03) : 311 - 324
  • [28] Pushing Purcell enhancement beyond its limits
    Barrett, Thomas D.
    Doherty, Thomas H.
    Kuhn, Axel
    NEW JOURNAL OF PHYSICS, 2020, 22 (06):
  • [29] Study on Deep Ultraviolet Computational Lithography Techniques
    Chen Guodong
    Zhang Zinan
    Li Sikun
    Wang Xiangzhao
    LASER & OPTOELECTRONICS PROGRESS, 2022, 59 (09)
  • [30] Porous silica frame for deep ultraviolet lithography
    Meixner, DL
    Ganguli, R
    Robinson, T
    Jeng, DY
    Morris, M
    Chaudhuri, SR
    Grenon, BJ
    JOURNAL OF MICROLITHOGRAPHY MICROFABRICATION AND MICROSYSTEMS, 2004, 3 (03): : 450 - 454
12345