Novel Design of a Ternary-CMOS With Vertical-Channel Double-Gate Field-Effect Transistors

被引:1
|
作者
Kim, Jiho [1 ]
Kim, Sangwoo [1 ]
Hwang, Jinyoung [1 ]
机构
[1] Korea Aerosp Univ, Sch Elect & Informat Engn, Goyang Si 10540, South Korea
基金
新加坡国家研究基金会;
关键词
Logic gates; Tunneling; Junctions; Semiconductor process modeling; Solid modeling; Performance evaluation; P-n junctions; MOSFET; ternary CMOS (T-CMOS); tunneling; vertical channel;
D O I
10.1109/TED.2022.3178362
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A tunneling-based ternary CMOS (T-CMOS) offering a low standby current and fast switching speed is developed using a novel device structure for field-effect transistors (FETs). In the new transistor devices, referred to as vertical-channel double-gate (VCDG)-FETs, a vertical current path from drain to source is formed on the drain, and a body placed below the drain is electrically isolated, except for the tunneling junction appearing at the drain and body interface. At the junction, most of the OFF-state current flows, which is independent of the gate voltage. Furthermore, the OFF-state current can be further reduced to the order of 10(-17) A by employing a drain with a retrograded doping profile. In this profile, the channel-drain junction tunneling current, which varies with the gate voltage, is substantially suppressed to less than the body-drain junction tunneling current in the OFF state. In addition, an electrostatic channel controlled using double gates facilitates a small subthreshold swing (SSW) of 65 mV/dec. With p- and n-channel VCDG-FETs, a T-CMOS exhibiting three logic states is developed with a standby current on the order of 1 pA and transfer characteristics with a very narrow transition width.
引用
收藏
页码:4081 / 4087
页数:7
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