Trace analysis of high-purity copper by total reflection X-ray fluorescence spectrometry

被引:7
|
作者
Yamaguchi, H
Itoh, S
Igarashi, S
Naitoh, K
Hasegawa, R
机构
[1] Natl Res Inst Met, Tsukuba, Ibaraki 3060047, Japan
[2] Ibaraki Univ, Fac Engn, Dept Mat Sci, Hitachi, Ibaraki 3168511, Japan
来源
关键词
D O I
10.1007/s002160051092
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
Total reflection X-ray fluorescence (TXRF) analysis after the separation of matrix element was studied for the determination of trace impurity elements (Ca, Sc, V, Cr, Mn, Fe, Co, Ni and Zn) in high purity copper. Matrix copper was removed by electrolysis (0.2 A, 8 h) of a nitric acid solution. A 10 mu L aliquot of the remaining solution of the electrolysis was dropped on a silicon-wafer sample-carrier and dried in a vacuum. This was repeated five times and the precipitate of five 10 mu L-aliquots was analyzed by TXRF using a W-L beta beam with an incident angle of 0.05 degrees. TXRF analytical values were obtained by using relative sensitivity factors of the analytes to the internal standard element (Pd). Detection limits of the analytes ranges from 0.077 ng for Zn to 0.785 ng for Ca.
引用
收藏
页码:395 / 398
页数:4
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