Enhanced photoelectrochemical performance of planar p-Silicon by APCVD deposition of surface mesoporous hematite coating

被引:13
|
作者
Li, Shipu [1 ]
Zhang, Peng [1 ]
Xie, Xiaofeng [2 ]
Song, Xuefeng [1 ]
Liu, Jing [1 ]
Zhao, Liping [1 ]
Chen, Han [1 ]
Gao, Lian [1 ]
机构
[1] Shanghai Jiao Tong Univ, Sch Mat Sci & Engn, State Key Lab Met Matrix Composites, Shanghai 200240, Peoples R China
[2] Chinese Acad Sci, Shanghai Inst Ceram, State Key Lab High Performance Ceram & Superfine, Shanghai 200050, Peoples R China
基金
中国国家自然科学基金;
关键词
Planar Si; alpha-Fe2O3; Catalysts; Photoelectrochemistry; Hydrogen; HYDROTHERMAL SYNTHESIS; WATER; PHOTOCATHODE; FILMS; NANOSTRUCTURES; PHOTOOXIDATION; PHOTOANODE; ARRAYS;
D O I
10.1016/j.apcatb.2016.07.031
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Pt nanoparticles are the most frequently used catalyst for Si photocathode. Alternative catalyst based on transition metal or metal oxide as cathode catalyst is greatly desired to replace Pt. A mesoporous alpha-Fe2O3 thin film (80 nm) was deposited on the surface of planar p-Si using a facile atmospheric pressure chemical vapor deposition (APCVD) method through pyrolysis of ferrocene. The planar Si photocathode shows a 400% enhancement in photocurrent at 1.0 V-RHE and an anodic onset potential shift of 0.5 V upon deposition of surface mesoporous alpha-Fe2O3 layer. This composite photo electrode also shows superior photoelectrochemical performance to the Pt/planar Si photoelectrode. (C) 2016 Elsevier B.V. All rights reserved.
引用
收藏
页码:372 / 377
页数:6
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