Interplay between intercalated oxygen superstructures and monolayer h-BN on Cu(100)

被引:18
|
作者
Ma, Chuanxu [1 ]
Park, Jewook [1 ]
Liu, Lei [2 ]
Kim, Yong-Sung [1 ,2 ,3 ,4 ]
Yoon, Mina [1 ,2 ]
Baddorf, Arthur P. [1 ]
Gu, Gong [2 ]
Li, An-Ping [1 ]
机构
[1] Oak Ridge Natl Lab, Ctr Nanophase Mat Sci, Oak Ridge, TN 37831 USA
[2] Univ Tennessee, Knoxville, TN 37996 USA
[3] Korea Res Inst Stand & Sci, Yuseong 305340, Daejeon, South Korea
[4] Korea Univ Sci & Technol, Dept Nano Sci, Daejeon 305350, South Korea
基金
美国国家科学基金会;
关键词
HEXAGONAL BORON-NITRIDE; TOTAL-ENERGY CALCULATIONS; HIGH-QUALITY; GRAPHENE; OXIDATION; RECONSTRUCTION; INTERFACE; STABILITY; DYNAMICS; GROWTH;
D O I
10.1103/PhysRevB.94.064106
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The confinement effect of intercalated atoms in van der Waals heterostructures can lead to interesting interactions between the confined atoms or molecules and the overlaying two-dimensional (2D) materials. Here we report the formation of ordered Cu(100) p(2 x 2) oxygen superstructures by oxygen intercalation under the monolayer hexagonal boron nitride (h-BN) on Cu after annealing. By using scanning tunneling microscopy and x-ray photoelectron spectroscopy, we identify the superstructure and reveal its roles in passivating the exposed Cu surfaces, decoupling h-BN and Cu, and disintegrating h-BN monolayers. The oxygen superstructure appears as a 2D pattern on the exposed Cu surface or quasi-1D stripes of paired oxygen intercalated in the interface of h-BN and Cu predominantly oriented along the moire modulations. The oxygen superstructure is shown to etch the overlaying h-BN monolayer in a thermal annealing process. After extended annealing, the h-BN monolayer disintegrates into nanoislands with zigzag edges. We discuss the implications of these findings on the stability and oxidation resistance of h-BN and relate them to challenges in process integration and 2D heterostructures.
引用
收藏
页数:8
相关论文
共 50 条
  • [41] Impact of Oxygen Coadsorption on Intercalation of Cobalt under the h-BN Nanomesh
    Preobrajenski, A. B.
    Ng, M. L.
    Vinogradov, N. A.
    Vinogradov, A. S.
    Lundgren, E.
    Mikkelsen, A.
    Martensson, N.
    NANO LETTERS, 2009, 9 (07) : 2780 - 2787
  • [42] Electronic decoupling by h-BN layer between silicene and Cu(111): A DFT-based analysis
    Kanno, Mao
    Arafune, Ryuichi
    Lin, Chun Liang
    Minamitani, Emi
    Kawai, Maki
    Takagi, Noriaki
    NEW JOURNAL OF PHYSICS, 2014, 16
  • [43] THE STRUCTURAL RELATIONS BETWEEN THE STABLE STEPPED COPPER FACES UPON OXYGEN-ADSORPTION AND THE OXYGEN SUPERSTRUCTURES ON CU(100) AND CU(110)
    BOULLIARD, JC
    SOTTO, MP
    SURFACE SCIENCE, 1987, 182 (1-2) : 200 - 212
  • [44] Inquisitive Geometric Sites in h-BN Monolayer for Alkali Earth Metal Ion Batteries
    Kansara, Shivam
    Gupta, Sanjeev K.
    Sonvane, Yogesh
    Pajtler, Maja Varga
    Ahuja, Rajeev
    JOURNAL OF PHYSICAL CHEMISTRY C, 2019, 123 (32): : 19340 - 19346
  • [45] Preparation and Research of Monolayer WS2 FETs Encapsulated by h-BN Material
    Han, Tao
    Liu, Hongxia
    Chen, Shupeng
    Wang, Shulong
    Yang, Kun
    MICROMACHINES, 2021, 12 (09)
  • [46] First-principles studies of graphene antidot lattices on monolayer h-BN substrate
    Wei, Zeng-Xin
    Liu, Gui-Bin
    PHYSICS LETTERS A, 2019, 383 (32)
  • [47] Enhancing exciton diffusion in monolayer WS2 with h-BN bottom layer
    Kang, Jang-Won
    Jung, Jin-Woo
    Lee, Taejin
    Kim, Jung Gon
    Cho, Chang-Hee
    PHYSICAL REVIEW B, 2019, 100 (20)
  • [48] Effects of strain and Al doping on monolayer h-BN: First-principles calculations
    Wang, ChengYue
    Wang, SuFang
    Li, ShaoRong
    Zhao, PengXiang
    Xing, Shan
    Zhuo, RiSheng
    Liang, Jing
    PHYSICA E-LOW-DIMENSIONAL SYSTEMS & NANOSTRUCTURES, 2023, 146
  • [49] Lateral heterojunctions within monolayer h-BN/graphene: a first-principles study
    Sun, Qilong
    Dai, Ying
    Ma, Yandong
    Wei, Wei
    Huang, Baibiao
    RSC ADVANCES, 2015, 5 (42) : 33037 - 33043
  • [50] Some Like It Flat: Decoupled h-BN Monolayer Substrates for Aligned Graphene Growth
    Roth, Silvan
    Greber, Thomas
    Osterwalder, Jurg
    ACS NANO, 2016, 10 (12) : 11187 - 11195