RETRACTION: Interactions between planar defects in bulk 3C-SiC (Retraction of Vol 389, Pg 108, 2014)

被引：0

作者：

Ikebe, Yohei ^{[1
]}

Nagasawa, Hiroyuki ^{[2
]}

Hatta, Naoki ^{[3
]}

Kawahara, Takamitsu ^{[3
]}

Yagi, Kuniaki ^{[3
]}

机构：

[1] HOYA Corp, Blanks Div, 3280 Nakamaru,Nagasaka Cho, Hokuto, Yamanashi 4088550, Japan

[2] Keio Univ, Fac Sci & Technol, Kohoku Ku, 3-14-1 Hiyoshi, Yokohama, Kanagawa 2238522, Japan

[3] SICOXS CORP, Chiyoda Ku, 3-12-8 Sotokanda, Tokyo 1010021, Japan

来源：

JOURNAL OF CRYSTAL GROWTH | 2018年 / 503卷

关键词：

D O I：

10.1016/j.jcrysgro.2018.09.045

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

引用

页码：64 / 64

页数：1

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