Nanolithography with the scanning probe microscope

被引：0
|
作者：
Chigir, GG
Emelyanov, VA
Ponomar, VN
Ukhov, VA
Sergeev, OV
Borisenko, VE
机构：
[1] INTEGRAL Sci Ind Enterprise, Minsk 220064, BELARUS
[2] Belarussian State Univ Informat & Radioelect, Minsk, BELARUS
来源：
PHYSICS OF LOW-DIMENSIONAL STRUCTURES | 2001年 / 3-4卷
关键词：
D O I：
暂无
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Brief results of thin resist layer fabrication and following exposition under probe-emitted electrons by means of "Nanodesigner" system are demonstrated.
引用
收藏
页码：327 / 332
页数：6
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