CVD growth of boron-rich nanostructures

被引:2
|
作者
Yu, Zhiyang [1 ,2 ]
Lea, Steffan [3 ]
Yuan, Jun [2 ,3 ]
机构
[1] Tsinghua Univ, Adv Mat Lab, Dept Mat Sci & Engn, Beijing 100084, Peoples R China
[2] Tsinghua Univ, Beijing Natl Ctr Electron Microscopy, Beijing 100084, Peoples R China
[3] Univ York, Dept Phys, York YO10 5DD, N Yorkshire, England
来源
ELECTRON MICROSCOPY AND ANALYSIS GROUP CONFERENCE 2009 (EMAG 2009) | 2010年 / 241卷
关键词
D O I
10.1088/1742-6596/241/1/012092
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Boron-rich nanostructures have been produced using a chemical vapour deposition method with iron particles as catalysts. Cyclic twinning nanowires and parallel twinning nanoplatelets have been identified using electron microscopy techniques such as selected area diffraction (SAD) for structural determination and electron energy-loss spectroscopy (EELS) for determining the chemical composition. This leads to the possibility of optimising the growth conditions of various boron-rich nanostructures, useful for further exploration of their physical properties.
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页数:4
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