High brightness, long, 940 nm diode lasers with double waveguide structure

被引:2
|
作者
Petrescu-Prahova, I [1 ]
Moritz, T [1 ]
Riordan, J [1 ]
机构
[1] High Power Dev, N Brunswick, NJ 08902 USA
来源
关键词
diode lasers; low confinement; high brightness; optical trap; optical wall;
D O I
10.1117/12.475752
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Two double-waveguide 940 nm asymmetric structures with 8 nm InxGa1-xAs quantum well (x = 0.13) are presented. They consist of an active region waveguide that includes a QW and an optical trap waveguide on the n side of the active region. The second structure has a supplementary optical wall in the p - clad that further pushes the optical field from the active region and reduces the confinement factor. The nominal lengths were chosen as 2.8 mm and 4 mm and the design values for the d/Gamma ratio were 0.8 mum and 1.14 mum, respectively. Devices were fabricated with 100 mum apertures and yielded threshold current densities of 0.2 kA/cm(2) and 0.17 kA/cm2 with corresponding slope efficiencies of 0.76 W/A and 0.85 W/A. At high current levels devices presented a power saturation behavior. The highest power values were 9.7 W (rollover) and 11.5 W (CMOD), respectively.
引用
收藏
页码:176 / 183
页数:8
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