Comparative Study of Short-Channel Effects Between Source-Gated Transistors and Standard Thin-Film Transistors

被引:8
|
作者
Wang, Zhenze [1 ]
Luo, Li [1 ]
Wang, Yiming [1 ]
Zhang, Jiawei [2 ,3 ]
Song, Aimin [2 ,4 ]
机构
[1] Shandong Univ, Shandong Technol Ctr Nanodevices & Integrat, Sch Microelect, Jinan 250100, Peoples R China
[2] Shandong Univ, Shandong Technol Ctr Nanodevices & Integrat, Sch Microelect, State Key Lab Crystal Mat, Jinan 250100, Peoples R China
[3] Shandong Univ, Suzhou Res Inst, Suzhou 215123, Peoples R China
[4] Univ Manchester, Sch Elect & Elect Engn, Manchester M13 9PL, Lancs, England
基金
中国国家自然科学基金;
关键词
Drain-induced barrier lowering (DIBL); Schottky contact; short-channel effect; source-gated transistor (SGT); thin-film transistor (TFT); ARRAYS;
D O I
10.1109/TED.2021.3140043
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
With the development of virtual reality and augmented reality, the pixel sizes of displays are reaching the sub- micrometer regime. One of the main challenges is the short-channel effect of the thin-film transistors (TFTs) in the driving circuits. In this work, we report the shortchannel effects of indium-gallium-zinc-oxide source-gated transistor (IGZO SGT). The simulation results show that when reducing the channel length down to 500 nm, the output impedance of the IGZO SGT is still high up to 4.13 x 108 Omega. mu m at gate-source voltage (V-GS) of 5 V and drain-source voltage (V-DS) of 7 V, 437 times higher than that of a conventional IGZO TFT of the same dimension. It is found that the Schottky source contact in SGTs can effectively suppress the back-channel current as compared with TFTs. The threshold voltage of short-channel SGTs remains almost the same when applying different drain voltages in contrast to TFTs. When V-DS changes from 5 to 7 V at V-GS = 5 V, the drain current of the IGZO TFT increases 23.7%, while the drain current of the SGT only increases 0.8%. The experimental results of IGZO TFTs and SGTs with a channel length of 500 nm showed similar dependence on the drain voltageto the simulation results. Such insensitivity to short-channel effectsmakes SGTs a promising candidate as current driving transistors in high-pixel-density display circuits.
引用
收藏
页码:561 / 566
页数:6
相关论文
共 50 条
  • [31] Evidence of Improved Thermal Stability via Nanoscale Contact Engineering in IGZO Source-Gated Thin-Film Transistors
    Alfarisyi, Salman
    Golec, Patryk
    Bestelink, Eva
    Niang, Kham M.
    Flewitt, Andrew J.
    Silva, S. Ravi P.
    Sporea, Radu A.
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2023, 70 (07) : 3582 - 3589
  • [32] Nonsaturating Drain Current Characteristic in Short-Channel Amorphous-Silicon Thin-Film Transistors
    Wie, Chu Ryang
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2010, 57 (04) : 846 - 854
  • [33] Physical mechanism of source and drain resistance reduction for high-performance short-channel InGaZnO thin-film transistors
    Ota, Kensuke
    Sakuma, Kiwamu
    Irisawa, Toshifumi
    Tanaka, Chika
    Matsushita, Daisuke
    Saitoh, Masumi
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2015, 54 (04)
  • [34] Short-Channel Top-Gate InGaZnO Thin-Film Transistors Fabricated With Boron Implantation Into Source/Drain Regions
    Takechi, Kazushige
    Lin, Feipeng
    He, Shui
    Yuan, Yong
    Tanaka, Jun
    Sera, Kenji
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2021, 68 (08) : 4161 - 4163
  • [35] 1-μm Short-Channel Oxide Thin-Film Transistors With Triangular Gate Spacer
    Choi, Ji Hun
    Yang, Jong-Heon
    Pi, Jae-Eun
    Hwang, Chi-Young
    Choi, Kyunghee
    Kim, Hee-Ok
    Kwon, Oh-Sang
    Hwang, Chi-Sun
    IEEE ELECTRON DEVICE LETTERS, 2017, 38 (10) : 1398 - 1400
  • [36] AN EXPERIMENTAL-STUDY ON THE SHORT-CHANNEL EFFECTS IN UNDERGATED POLYSILICON THIN-FILM TRANSISTORS WITH AND WITHOUT LIGHTLY DOPED DRAIN STRUCTURES
    LIU, CT
    LEE, KH
    IEEE ELECTRON DEVICE LETTERS, 1993, 14 (03) : 149 - 151
  • [37] Printed, short-channel, top-gate carbon nanotube thin-film transistors on flexible plastic film
    Maeda, Michihiko
    Hirotani, Jun
    Matsui, Ryotaro
    Higuchi, Kentaro
    Kishimoto, Shigeru
    Tomura, Takuya
    Takesue, Masafumi
    Hata, Katsuhiko
    Ohno, Yutaka
    APPLIED PHYSICS EXPRESS, 2015, 8 (04)
  • [38] PHYSICAL-MECHANISMS FOR SHORT CHANNEL EFFECTS IN POLYSILICON THIN-FILM TRANSISTORS
    LEWIS, AG
    HUANG, TY
    WU, IW
    BRUCE, RH
    CHIANG, A
    1989 INTERNATIONAL ELECTRON DEVICES MEETING, TECHNICAL DIGEST, 1989, : 349 - 352
  • [39] Reverse short-channel effect in metal-induced laterally crystallized polysilicon thin-film transistors
    Wong, M
    Bhat, GA
    Kwok, HS
    IEEE ELECTRON DEVICE LETTERS, 1999, 20 (11) : 566 - 568
  • [40] Short channel effects in polysilicon thin film transistors
    Fortunato, G
    Valletta, A
    Gaucci, P
    Mariucci, L
    Brotherton, SD
    THIN SOLID FILMS, 2005, 487 (1-2) : 221 - 226