Semiconductor materials characterisation by Raman spectroscopy

被引:0
|
作者
Bose, DN
Bandopadhyay, AK
机构
[1] Univ Calcutta, USIC, Kolkata 700009, W Bengal, India
[2] Natl Phys Lab, New Delhi 110012, India
关键词
Raman spectroscopy; semiconductors; quantum wells;
D O I
暂无
中图分类号
O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];
学科分类号
07 ; 0710 ; 09 ;
摘要
Among optical techniques used in the characterization of semiconductors, Raman Spectroscopy (RS) has emerged as a powerful tool. Its advantages are its versatility and well-developed theory which permits the study of phonons, quantitative determination of carrier concentration, stress and electric field besides identification of impurities and unknown phases. It is complementary to the well-known technique of Photoluminescence (PL) and requires similar equipment. RS has also proved to be the most powerful technique for investigating vibrational excitations in superlattices. This paper reviews the application of Raman spectroscopy to semiconductor materials characterisation and provides examples from studies on surface passivation of CdTe. ion-implantation of Si donors in GaAs and evaluation of InGaAs / InP quantum wells.
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页码:139 / 143
页数:5
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