Oxygen vacancy defects in tantalum pentoxide: a density functional study

被引:0
|
作者
Ramprasad, R [1 ]
Sadd, M [1 ]
Roberts, D [1 ]
Remmel, T [1 ]
Raymond, M [1 ]
Luckowski, E [1 ]
Kalpat, S [1 ]
Barron, C [1 ]
Miller, M [1 ]
机构
[1] Motorola Semicond Prod Sector, Tempe, AZ 85284 USA
关键词
D O I
暂无
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
First principles total energy calculations were per-formed in order to characterize O vacancy defects in Ta2O5. A simplified version of the crystalline orthorhombic phase of Ta2O5 was used in this study. Results indicate that O vacancies in Ta2O5 can be broadly classified based on their location in the lattice. One type of vacancies (occupying the "in-plane" sites) displays deep or mid gap occupied states, and shallow unoccupied states, while a second type (occupying "cap" sites) results in shallow occupied states. For a wide range of local Fermi level or chemical potential, the neutral and +2 charged states of the in-plane type vacancy and the +2 charge state of the cap type vacancy are found to be most stable. Migration energies of the two types of vacancies in the neutral and +2 charge states are markedly different, with the "cap" type of vacancies displaying very high barriers to migration (similar to 5 eV) compared to the "in-plane" type (similar to 0.5-1.0 eV).
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页码:113 / 118
页数:6
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