Hydrogen and magnesium incorporation on c-plane and m-plane GaN surfaces

被引:22
|
作者
Northrup, John E. [1 ]
机构
[1] IBM Corp, Palo Alto Sci Ctr, Palo Alto, CA 94304 USA
关键词
D O I
10.1103/PhysRevB.77.045313
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The effect of hydrogen on Mg incorporation for both polar and nonpolar GaN surfaces is explored using density functional total energy calculations. A thermodynamic approach is employed, with chemical potentials appropriate for realistic growth conditions. It is shown that hydrogen stabilizes new Mg-rich surface reconstructions for both the (0001) and (10 (1) over bar0) surfaces. Hydrogen greatly enhances the stability of Mg-rich reconstructions of the m plane. Experimental results for p-type doping obtained in growth on both the m-plane and c-plane surfaces can be understood on the basis of these results. A laterally contracted row model for the GaN(10 (1) over bar0) surface is shown to be energetically favorable in Ga-rich conditions.
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页数:7
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