Overlay improvement through overlay modeling.

被引：1
|
作者：
Borodovsky, Y [1 ]
机构：
[1] INTEL CORP,PORTLAND TECHNOL DEV,HILLSBORO,OR 97124
来源：
OPTICAL MICROLITHOGRAPHY IX | 1996年 / 2726卷
关键词：
microlithography; overlay; registration; modeling;
D O I：
10.1117/12.240973
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
引用
收藏
页码：311 / 322
页数：12
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