Effect of the nature of annealing solvent on the morphology of diblock copolymer blend thin films

被引:38
|
作者
Guo, Rui [1 ]
Huang, Haiying [1 ]
Chen, Yongzhong [1 ]
Gong, Yumei [1 ]
Du, Binyang [2 ]
He, Tianbai [1 ]
机构
[1] Chinese Acad Sci, Changchun Inst Appl Chem, State Key Lab Polymer Phys & Chem, Changchun 130022, Peoples R China
[2] Zhejiang Univ, Dept Polymer Sci & Engn, Key Lab macromol Synth & Functionalizat, Hangzhou 310027, Peoples R China
关键词
D O I
10.1021/ma701979q
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
The morphologies and structures for the thin film of blend systems consisting of two asymmetric polystyrene-block-polybutadiene (SB) diblock copolymers induced by annealing in the vapor of different solvents, namely, cyclohexane, benzene, and heptane, which have different selectivity or preferential affinity for a certain block, were investigated by tapping mode atomic force microscopy (AFM) and transmission electron microscopy (TEM). The results revealed that even a slight preferential affinity of good solvent for one block would strongly alter the morphology of the blend thin film. An interesting structure of so-called "spheres-between-cylinders" ("sph-b-cyl") was obtained when annealing the blend thin film with a weight fraction ratio of 50/50 of the two components in the saturated vapor of cyclohexane, which is a good solvent for]:PB and a (near) E) solvent for PS at 34.5 degrees C. The influence of the kinetic factors, such as the annealing time and vapor pressure of the solvent, together with the factors of the blend composition and the film thickness, on the morphology forming in the blend thin film systems was also investigated. Blending the block copolymers together with the solvent treatments is proved to be an effective way to control the structure and morphology of the thin films.
引用
收藏
页码:890 / 900
页数:11
相关论文
共 50 条
  • [41] INTERFERENCE MICROSCOPY ON THIN DIBLOCK COPOLYMER FILMS
    COULON, G
    AUSSERRE, D
    RUSSELL, TP
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1989, 197 : 198 - POLY
  • [42] Boundary effect of relief structure on crystallization of diblock copolymer in thin films
    Zhang, FJ
    Chen, YZ
    Huang, HY
    Hu, ZJ
    He, TB
    LANGMUIR, 2003, 19 (14) : 5563 - 5566
  • [43] Hole nucleation in thin diblock copolymer films
    S. Joly
    D. Ausserré
    G. Brotons
    Y. Gallot
    The European Physical Journal E, 2002, 8 : 355 - 363
  • [44] Hole nucleation in thin diblock copolymer films
    Joly, S
    Ausserré, D
    Brotons, G
    Gallot, Y
    EUROPEAN PHYSICAL JOURNAL E, 2002, 8 (04): : 355 - 363
  • [45] INTERFERENCE MICROSCOPY ON THIN DIBLOCK COPOLYMER FILMS
    COULON, G
    AUSSERRE, D
    RUSSELL, TP
    JOURNAL DE PHYSIQUE, 1990, 51 (08): : 777 - 786
  • [46] Confinement of symmetric diblock copolymer thin films
    Tang, WH
    MACROMOLECULES, 2000, 33 (04) : 1370 - 1384
  • [47] Nanodomain Development of Semifluorinated Diblock Copolymeric Thin Films via Solvent Vapor Annealing
    Islam, Mohammad Tariqul
    Gal, Yeong Soon
    Park, Jong Myung
    Lim, Kwon Taek
    JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2011, 11 (05) : 4506 - 4510
  • [48] Pathways of cylindrical orientations in PS-b-P4VP diblock copolymer thin films upon solvent vapor annealing
    Gowd, E. Bhoje
    Koga, Tadanori
    Endoh, Maya K.
    Kumar, Kamlesh
    Stamm, Manfred
    SOFT MATTER, 2014, 10 (39) : 7753 - 7761
  • [49] Cyclic Solvent Annealing Improves Feature Orientation in Block Copolymer Thin Films
    Paradiso, Sean P.
    Delaney, Kris T.
    Garcia-Cervera, Carlos J.
    Ceniceros, Hector D.
    Fredrickson, Glenn H.
    MACROMOLECULES, 2016, 49 (05) : 1743 - 1751
  • [50] High-Precision Solvent Vapor Annealing for Block Copolymer Thin Films
    Nelson, Gunnar
    Drapes, Chloe S.
    Grant, Meagan A.
    Gnabasik, Ryan
    Wong, Jeffrey
    Baruth, Andrew
    MICROMACHINES, 2018, 9 (06):