Construction of an n-body potential and molecular-dynamics study of interfacial reaction in the Ni/Mo bilayer

被引：6
|
作者：
Zhang, Q [1 ]
Lai, WS
Liu, BX
机构：
[1] Tsing Hua Univ, Dept Mat Sci & Engn, Beijing 100084, Peoples R China
[2] Nanjing Univ, Natl Lab Solid State Microstruct Phys, Nanjing 210093, Peoples R China
来源：
EUROPHYSICS LETTERS | 1998年 / 43卷 / 04期
关键词：
D O I：
10.1209/epl/i1998-00374-9
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
An n-body potential is constructed for the Ni-Mo system based on the Finnis-Sinclair formalism. The potential with optimized parameters is able to reproduce some physical properties of several Ni-Mo equilibrium and metastable alloy phases. Molecular-dynamics simulation with the constructed potential is performed to study the detailed process of interfacial reaction in a Ni/Mo bilayer upon annealing: at medium temperatures of 300 to 600 degrees C and reveals that amorphization is driven by mutual atomic diffusion and follows exactly a t(1/2) law.
引用
收藏
页码：416 / 421
页数：6
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