Characterization of amorphous aluminium oxide thin films synthesized by mist-CVD

被引:0
|
作者
Yatabe, Zenji [1 ]
Nishiyama, Koshi [1 ]
Tsuda, Takaaki [1 ]
Nishimura, Kazuki [1 ]
Nakamura, Yusui [1 ,2 ]
机构
[1] Kumamoto Univ, Kumamoto, Japan
[2] Kumamoto Phoen, Kumamoto, Japan
关键词
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页数:1
相关论文
共 50 条
  • [31] Optical band gap of nitrogenated amorphous carbon thin films synthesized by microwave surface wave plasma CVD
    Adhikari, Sudip
    Aryal, Hare Ram
    Ghimire, Dilip Chandra
    Kalita, Golap
    Umeno, Masayoshi
    DIAMOND AND RELATED MATERIALS, 2008, 17 (7-10) : 1666 - 1668
  • [32] Amorphous niobium oxide thin films
    Ramirez, G.
    Rodil, S. E.
    Muhl, S.
    Turcio-Ortega, D.
    Olaya, J. J.
    Rivera, M.
    Camps, E.
    Escobar-Alarcon, L.
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 2010, 356 (50-51) : 2714 - 2721
  • [33] Characterization of FeS2-pyrite thin films synthesized by sulphuration of amorphous iron oxide films pre-deposited by spray pyrolysis
    Ouertani, B
    Ouerfelli, J
    Saadoun, M
    Bessais, B
    Ezzaouia, H
    Bernède, JC
    MATERIALS CHARACTERIZATION, 2005, 54 (4-5) : 431 - 437
  • [34] Incorporation of yttrium to yttrium iron garnet thin films fabricated by mist CVD
    Liu, Li
    Suwa, Yuta
    Sato, Shota
    Nakasone, Yoshiaki
    Nishi, Misaki
    Dang, Giang T.
    Pradeep, Ellawala K. C.
    Kawaharamura, Toshiyuki
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2017, 56 (04)
  • [35] XAFS study of amorphous aluminium alloy thin films
    Watanabe, T
    Umesaki, N
    Wakita, H
    Onishi, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1999, 38 : 516 - 519
  • [36] Characterization of aluminium doped zinc oxide thin films deposited on polymeric substrates
    Fortunato, E
    Nunes, P
    Costa, D
    Brida, D
    Ferreira, I
    Martins, R
    VACUUM, 2002, 64 (3-4) : 233 - 236
  • [37] Characterization of nitrogenated amorphous carbon thin films grown by microwave surface wave plasma CVD
    Aryal, HR
    Adhikari, S
    Omer, AMM
    Adhikary, S
    Uchida, H
    Umeno, M
    PHYSICA B-CONDENSED MATTER, 2006, 376 : 331 - 333
  • [38] Surface characterization of CVD diamond thin films
    Kurokawa, Y
    Kawamura, H
    Maki, T
    Kobayashi, T
    DIAMOND FILMS AND TECHNOLOGY, 1997, 7 (5-6): : 309 - 309
  • [39] Heteroepitaxial growth of a-Ga 2 O 3 thin films on a-, c- and r -plane sapphire substrates by low-cost mist-CVD method
    Cheng, Yaolin
    Xu, Yu
    Li, Zhe
    Zhang, Jiaqi
    Chen, Dazheng
    Feng, Qian
    Xu, Shengrui
    Zhou, Hong
    Zhang, Jincheng
    Hao, Yue
    Zhang, Chunfu
    JOURNAL OF ALLOYS AND COMPOUNDS, 2020, 831
  • [40] Rapid epitaxy of 2-inch and high-quality α-Ga2O3 films by mist-CVD method
    Wang, Xiaojie
    Mu, Wenxiang
    Xie, Jiahui
    Zhang, Jinteng
    Li, Yang
    Jia, Zhitai
    Tao, Xutang
    JOURNAL OF SEMICONDUCTORS, 2023, 44 (06)