The thermal and electron-induced chemistry of N2O/Ag(111)

The thermal and electron-induced chemistry of N2O on Ag(111) was examined using temperature programmed desorption (TPD) and Auger electron spectroscopy (AES). N2O adsorbs and desorbs molecularly with multilayer and monolayer desorption temperatures of 86 and 94-102 K, respectively. No thermal decomposition was observed. Irradiation with SD and 2500 eV electrons at 83 K causes partial decomposition of multilayers; N-2 desorbs during irradiation, and O-2 desorption, at 530 K, is observed in post-irradiation TPD. Only O and Ag are detected by AES alter Bashing irradiated samples to 500 K; O disappears above 700 K. Incident and secondary electrons can account for the observed surface chemistry and the latter can account for reported N2O decomposition in X-ray photoelectron measurements. For monolayer coverages, irradiated with 50 eV electrons, there is no dissociation, an effect attributed to substrate quenching.