Direct Measurement of Potentials in the Reactive Ion-Plasma Etching System

Devices for direct measurement of the plasma potential and floating potential in the gas discharge in a reactive ion-plasma etching system are presented. The action of the devices developed for this purpose is based on the creation of a local magnetic field that makes it possible to purposefully change the conditions of ambipolar diffusion of charged particles. This allows the contact of the probe with the body of the positive plasma column without the appearance of floating potential on it. The results of measuring the plasma potential by the proposed and alternative methods are compared.